SUBSTRATE TABLE FOR LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF USING SUBSTRATE TABLE, AND METHOD OF DEVICE MANUFACTURING

PROBLEM TO BE SOLVED: To provide a system which improves stability of a meniscus or reduces incompleteness of the meniscus, where the system is, for example, to reduce a possibility of generating a bubble or releasing a drop.SOLUTION: A cover for a substrate table in an immersion lithographic appara...

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Bibliographische Detailangaben
Hauptverfasser:	ROSET NIEK JACOBUS JOHANNES, KATE NICOLAAS TEN, ZDRAVKOV ALEXANDER NIKOLOV, KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA, PATEL HRISHIKESH, VAN OPSTAL SANDER, BENSCHOP JOZEF PETRUS HENRICUS, LAFARRE RAYMOND WILHELMUS LOUIS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system which improves stability of a meniscus or reduces incompleteness of the meniscus, where the system is, for example, to reduce a possibility of generating a bubble or releasing a drop.SOLUTION: A cover for a substrate table in an immersion lithographic apparatus is provided to cover at least a gap between a substrate and a recess in the substrate table for receiving the substrate.