FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To disclose a fluid handling structure configured to supply and confine an immersion liquid in a space demarcated between a projection system and a counter surface countered to the system itself. SOLUTION: In a first portion of a lower surface of the fluid handling structure, a...

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Hauptverfasser:	DANNY MARIA HUBERTUS PHILIPS, BERKVENS PAUL PETRUS JOANNES, MAIKEL ADRIANUS CORNELIS SCHEPERS, DIREKS DANIEL JOSEPH MARIA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To disclose a fluid handling structure configured to supply and confine an immersion liquid in a space demarcated between a projection system and a counter surface countered to the system itself. SOLUTION: In a first portion of a lower surface of the fluid handling structure, a distance from the counter surface when using the first portion is different from that of a second portion of the lower surface. The first portion is demarcated in the structure itself and has a supply opening configured to supply liquid to the counter surface and an extraction opening configured to remove fluid from the space between the fluid handling structure and the counter surface. COPYRIGHT: (C)2011,JPO&INPIT