METHOD OF CHARACTERIZING FEATURE OF PREDETERMINED TYPE ON SUBSTRATE, AND COMPUTER PROGRAM PRODUCT
PROBLEM TO BE SOLVED: To provide a method useful for measuring topographical features of a substrate. SOLUTION: A coating method of the substrate for activating gas using an electron beam is disclosed. The coated substrate is then sliced using an ion beam to clarify resist features in the cross sect...
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| creator | RIJPERS BARTOLOMEUS P CRAMER HUGO AUGUSTINUS JOSEPH |
| description | PROBLEM TO BE SOLVED: To provide a method useful for measuring topographical features of a substrate. SOLUTION: A coating method of the substrate for activating gas using an electron beam is disclosed. The coated substrate is then sliced using an ion beam to clarify resist features in the cross section direction. The features of resist are measured using a scanning electron microscope, and a focused ion beam is used for taking the slicing of the substrate and clarifying a new cross section. This new cross section is then measured using the scanning electron microscope. Thus, a three-dimensional map of the features may be built up. COPYRIGHT: (C)2011,JPO&INPIT |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2010230686A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2010230686A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2010230686A3</originalsourceid><addsrcrecordid>eNqNissKwjAQAHvxIOo_LJ4Vagul1zXZPoQ8SDcHvZQg8SRaqP-PKfgBngZmZp0FRdwZCaYB0aFDweT6W69baAjZO1qKdSQpBdVrksBXm6yGwZ8Hdsh0ANQShFHWpyndpnWoFkoveJutHuE5x92Pm2zfEIvuGKf3GOcp3OMrfsaLLfJTXpR5VVdY_jV9ASaJNEQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD OF CHARACTERIZING FEATURE OF PREDETERMINED TYPE ON SUBSTRATE, AND COMPUTER PROGRAM PRODUCT</title><source>esp@cenet</source><creator>RIJPERS BARTOLOMEUS P ; CRAMER HUGO AUGUSTINUS JOSEPH</creator><creatorcontrib>RIJPERS BARTOLOMEUS P ; CRAMER HUGO AUGUSTINUS JOSEPH</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a method useful for measuring topographical features of a substrate. SOLUTION: A coating method of the substrate for activating gas using an electron beam is disclosed. The coated substrate is then sliced using an ion beam to clarify resist features in the cross section direction. The features of resist are measured using a scanning electron microscope, and a focused ion beam is used for taking the slicing of the substrate and clarifying a new cross section. This new cross section is then measured using the scanning electron microscope. Thus, a three-dimensional map of the features may be built up. COPYRIGHT: (C)2011,JPO&INPIT</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CINEMATOGRAPHY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MATERIALS THEREFOR ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101014&DB=EPODOC&CC=JP&NR=2010230686A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20101014&DB=EPODOC&CC=JP&NR=2010230686A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RIJPERS BARTOLOMEUS P</creatorcontrib><creatorcontrib>CRAMER HUGO AUGUSTINUS JOSEPH</creatorcontrib><title>METHOD OF CHARACTERIZING FEATURE OF PREDETERMINED TYPE ON SUBSTRATE, AND COMPUTER PROGRAM PRODUCT</title><description>PROBLEM TO BE SOLVED: To provide a method useful for measuring topographical features of a substrate. SOLUTION: A coating method of the substrate for activating gas using an electron beam is disclosed. The coated substrate is then sliced using an ion beam to clarify resist features in the cross section direction. The features of resist are measured using a scanning electron microscope, and a focused ion beam is used for taking the slicing of the substrate and clarifying a new cross section. This new cross section is then measured using the scanning electron microscope. Thus, a three-dimensional map of the features may be built up. COPYRIGHT: (C)2011,JPO&INPIT</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNissKwjAQAHvxIOo_LJ4Vagul1zXZPoQ8SDcHvZQg8SRaqP-PKfgBngZmZp0FRdwZCaYB0aFDweT6W69baAjZO1qKdSQpBdVrksBXm6yGwZ8Hdsh0ANQShFHWpyndpnWoFkoveJutHuE5x92Pm2zfEIvuGKf3GOcp3OMrfsaLLfJTXpR5VVdY_jV9ASaJNEQ</recordid><startdate>20101014</startdate><enddate>20101014</enddate><creator>RIJPERS BARTOLOMEUS P</creator><creator>CRAMER HUGO AUGUSTINUS JOSEPH</creator><scope>EVB</scope></search><sort><creationdate>20101014</creationdate><title>METHOD OF CHARACTERIZING FEATURE OF PREDETERMINED TYPE ON SUBSTRATE, AND COMPUTER PROGRAM PRODUCT</title><author>RIJPERS BARTOLOMEUS P ; CRAMER HUGO AUGUSTINUS JOSEPH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2010230686A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>RIJPERS BARTOLOMEUS P</creatorcontrib><creatorcontrib>CRAMER HUGO AUGUSTINUS JOSEPH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RIJPERS BARTOLOMEUS P</au><au>CRAMER HUGO AUGUSTINUS JOSEPH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF CHARACTERIZING FEATURE OF PREDETERMINED TYPE ON SUBSTRATE, AND COMPUTER PROGRAM PRODUCT</title><date>2010-10-14</date><risdate>2010</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method useful for measuring topographical features of a substrate. SOLUTION: A coating method of the substrate for activating gas using an electron beam is disclosed. The coated substrate is then sliced using an ion beam to clarify resist features in the cross section direction. The features of resist are measured using a scanning electron microscope, and a focused ion beam is used for taking the slicing of the substrate and clarifying a new cross section. This new cross section is then measured using the scanning electron microscope. Thus, a three-dimensional map of the features may be built up. COPYRIGHT: (C)2011,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING |
| title | METHOD OF CHARACTERIZING FEATURE OF PREDETERMINED TYPE ON SUBSTRATE, AND COMPUTER PROGRAM PRODUCT |
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