INFRARED OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME
PROBLEM TO BE SOLVED: To provide an infrared optical filter which has an infrared ray interrupting function in a broad band region from a near infrared ray to a far infrared ray and which is low in cost. SOLUTION: The infrared optical filter controlling infrared rays in a wavelength region of 800 to...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | HIRAI TAKAHIKO KITAMURA KEIMEI |
description | PROBLEM TO BE SOLVED: To provide an infrared optical filter which has an infrared ray interrupting function in a broad band region from a near infrared ray to a far infrared ray and which is low in cost. SOLUTION: The infrared optical filter controlling infrared rays in a wavelength region of 800 to 20,000 nm includes a semiconductor substrate 1, a broad band region interrupting filter section 2 formed on one surface side of the semiconductor substrate 1 and a narrow band region transmissive filter section 3 formed on another surface side of the semiconductor substrate 1. The broad band region interrupting filter section 2 is constituted of a multilayer film formed by laminating two or more kinds of thin films 2a, 2b having different refractive indexes. One kind of thin film 2a among two or more kinds of thin films 2a, 2b is formed of a far-infrared ray absorbing material (for example Al2O3) and one residual kind of the thin film 2b is formed of a high refractive index material with a refractive index higher than that of the far-infrared ray absorbing material (for example Ge). COPYRIGHT: (C)2010,JPO&INPIT |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2010186145A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2010186145A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2010186145A3</originalsourceid><addsrcrecordid>eNrjZLD19HMLcgxydVHwDwjxdHb0UXDz9AlxDVJw9HNR8HUN8fB3UXDzD1LwdfQLdXN0DgkN8vRzVwjxcFUIdvR15WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGBoYWZoYmpo7GRCkCAGV3KgM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>INFRARED OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME</title><source>esp@cenet</source><creator>HIRAI TAKAHIKO ; KITAMURA KEIMEI</creator><creatorcontrib>HIRAI TAKAHIKO ; KITAMURA KEIMEI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an infrared optical filter which has an infrared ray interrupting function in a broad band region from a near infrared ray to a far infrared ray and which is low in cost. SOLUTION: The infrared optical filter controlling infrared rays in a wavelength region of 800 to 20,000 nm includes a semiconductor substrate 1, a broad band region interrupting filter section 2 formed on one surface side of the semiconductor substrate 1 and a narrow band region transmissive filter section 3 formed on another surface side of the semiconductor substrate 1. The broad band region interrupting filter section 2 is constituted of a multilayer film formed by laminating two or more kinds of thin films 2a, 2b having different refractive indexes. One kind of thin film 2a among two or more kinds of thin films 2a, 2b is formed of a far-infrared ray absorbing material (for example Al2O3) and one residual kind of the thin film 2b is formed of a high refractive index material with a refractive index higher than that of the far-infrared ray absorbing material (for example Ge). COPYRIGHT: (C)2010,JPO&INPIT</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2010</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100826&DB=EPODOC&CC=JP&NR=2010186145A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20100826&DB=EPODOC&CC=JP&NR=2010186145A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIRAI TAKAHIKO</creatorcontrib><creatorcontrib>KITAMURA KEIMEI</creatorcontrib><title>INFRARED OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME</title><description>PROBLEM TO BE SOLVED: To provide an infrared optical filter which has an infrared ray interrupting function in a broad band region from a near infrared ray to a far infrared ray and which is low in cost. SOLUTION: The infrared optical filter controlling infrared rays in a wavelength region of 800 to 20,000 nm includes a semiconductor substrate 1, a broad band region interrupting filter section 2 formed on one surface side of the semiconductor substrate 1 and a narrow band region transmissive filter section 3 formed on another surface side of the semiconductor substrate 1. The broad band region interrupting filter section 2 is constituted of a multilayer film formed by laminating two or more kinds of thin films 2a, 2b having different refractive indexes. One kind of thin film 2a among two or more kinds of thin films 2a, 2b is formed of a far-infrared ray absorbing material (for example Al2O3) and one residual kind of the thin film 2b is formed of a high refractive index material with a refractive index higher than that of the far-infrared ray absorbing material (for example Ge). COPYRIGHT: (C)2010,JPO&INPIT</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2010</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLD19HMLcgxydVHwDwjxdHb0UXDz9AlxDVJw9HNR8HUN8fB3UXDzD1LwdfQLdXN0DgkN8vRzVwjxcFUIdvR15WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGBoYWZoYmpo7GRCkCAGV3KgM</recordid><startdate>20100826</startdate><enddate>20100826</enddate><creator>HIRAI TAKAHIKO</creator><creator>KITAMURA KEIMEI</creator><scope>EVB</scope></search><sort><creationdate>20100826</creationdate><title>INFRARED OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME</title><author>HIRAI TAKAHIKO ; KITAMURA KEIMEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2010186145A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2010</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>HIRAI TAKAHIKO</creatorcontrib><creatorcontrib>KITAMURA KEIMEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIRAI TAKAHIKO</au><au>KITAMURA KEIMEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>INFRARED OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME</title><date>2010-08-26</date><risdate>2010</risdate><abstract>PROBLEM TO BE SOLVED: To provide an infrared optical filter which has an infrared ray interrupting function in a broad band region from a near infrared ray to a far infrared ray and which is low in cost. SOLUTION: The infrared optical filter controlling infrared rays in a wavelength region of 800 to 20,000 nm includes a semiconductor substrate 1, a broad band region interrupting filter section 2 formed on one surface side of the semiconductor substrate 1 and a narrow band region transmissive filter section 3 formed on another surface side of the semiconductor substrate 1. The broad band region interrupting filter section 2 is constituted of a multilayer film formed by laminating two or more kinds of thin films 2a, 2b having different refractive indexes. One kind of thin film 2a among two or more kinds of thin films 2a, 2b is formed of a far-infrared ray absorbing material (for example Al2O3) and one residual kind of the thin film 2b is formed of a high refractive index material with a refractive index higher than that of the far-infrared ray absorbing material (for example Ge). COPYRIGHT: (C)2010,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_JP2010186145A |
source | esp@cenet |
subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | INFRARED OPTICAL FILTER AND METHOD FOR MANUFACTURING THE SAME |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T08%3A21%3A48IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HIRAI%20TAKAHIKO&rft.date=2010-08-26&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2010186145A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |