METHOD FOR PRODUCING SPUTTERING TARGET MATERIAL

PROBLEM TO BE SOLVED: To provide a method for stably producing a sputtering target material where, when a sputtering target material of an Fe-Co based alloy used for the formation of a soft magnetic film used for a vertical magnetic recording medium or the like is produced from a cast ingot, the cas...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FUKUOKA ATSUSHI, FUJIMOTO MITSUHARU, UENO SUGURU, UENO TOMONORI
Format:	Patent
Sprache:	eng
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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