METHOD FOR PRODUCING SPUTTERING TARGET MATERIAL

PROBLEM TO BE SOLVED: To provide a method for stably producing a sputtering target material where, when a sputtering target material of an Fe-Co based alloy used for the formation of a soft magnetic film used for a vertical magnetic recording medium or the like is produced from a cast ingot, the cast ingot is subjected to plastic working. SOLUTION: In the method for producing a sputtering target material, a columnar cast ingot composed of an Fe-Co based alloy whose compositional formula in an atomic ratio is expressed by ((Fe100-X-CoX)100-Y-NiY)100-a-M1a, 5≤X≤95, 0≤Y≤25 and 5≤a≤20; wherein the M1 element in the compositional formula is one or more elements selected from B, Zr, Hf, Ta, Nb and Y, and in which a diameter/height ratio is 0.5 to 2 is inserted into a pressurizing mold, and is subjected to upsetting by hot press at an upsetting ratio of 30 to 70% in the temperature range of 900 to 1,250°C so as to obtain a target stock. COPYRIGHT: (C)2010,JPO&INPIT