LITHOGRAPHY APPARATUS AND METHOD OF DETERMINING POLARIZATION PROPERTY

PROBLEM TO BE SOLVED: To provide a method for obtaining polarization property of a lithography apparatus. SOLUTION: The lithography apparatus includes an illumination system IL, a support, a substrate table, a projection system PS, and a detector 14. The apparatus further includes: a polarization ch...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	VEN DE KERKHOF MARCUS ADRIANUS, BOEIJ WILHELMUS PETRUS DE, KLAASSEN MICHEL FRANSOIS HUBERT, ROOIJAKKERS WILHELMUS JACOBUS MARIA, UITTERDIJK TAMMO, GREEVENBROEK HENDRIKUS ROBERTUS MARIE VAN, KOK HAICO VICTOR, WEHRENS MARTIJN GERARD DOMINIQUE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!