METHOD FOR MANUFACTURING OPTICAL ELEMENT ARRAY, OPTICAL ELEMENT ARRAY, AND OPTICAL SYSTEM

PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical element array by which an optical element having a small height difference is easily and accurately formed. SOLUTION: In the method, the optical element array 10 is manufactured by providing a photoresist layer 15 on optical base...

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Bibliographische Detailangaben
Hauptverfasser:	OKURA HAJIME, ARAI YOSHIHISA, AOYANAGI KAZUNORI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICALDEVICES MICROSTRUCTURAL TECHNOLOGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for manufacturing an optical element array by which an optical element having a small height difference is easily and accurately formed. SOLUTION: In the method, the optical element array 10 is manufactured by providing a photoresist layer 15 on optical base material 11, forming a rugged shape part 21 on a surface of the photoresist layer 15 by exposing and developing the photoresist layer 15, and etching the photoresist layer 15 and the optical base material 11, thereby forming the optical element 13 having shape in accordance with the rugged shape part 21 on a surface of the optical base material 11. By carrying out etching after a selection ratio of the photoresist layer 15 to the optical base material 10 is adjusted to be under 1, the optical element 13 having the height difference smaller than that of the rugged shape part 21 is formed. COPYRIGHT: (C)2010,JPO&INPIT