INERT GAS ATMOSPHERE FURNACE DEVICE

PROBLEM TO BE SOLVED: To provide a drying processing device or a firing processing device capable of minimizing an opening for taking in and out a workpiece to prevent or minimize leakage of an inert gas. SOLUTION: An insert gas atmosphere furnace device for processing a processed workpiece under an...

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Hauptverfasser: KAWAHARA MASARU, SAITO MISAO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a drying processing device or a firing processing device capable of minimizing an opening for taking in and out a workpiece to prevent or minimize leakage of an inert gas. SOLUTION: An insert gas atmosphere furnace device for processing a processed workpiece under an inert gas atmosphere, is composed of a furnace body and a big door 14, and includes a plurality of workpiece holding means, at least one workpiece transferring opening, a small door 34, a big door moving means 30, a small door opening and closing means, a workpiece transferring robot, a sealing means 20 and a clamp means, and a seal means. COPYRIGHT: (C)2009,JPO&INPIT