DEVICE AND METHOD FOR INSPECTING IMAGE DEFECT

PROBLEM TO BE SOLVED: To reduce lowering of inspection efficiency which results from scanning these basic patterns in the same direction, when picking up a plurality of basic patterns not running in the main scanning direction, by performing two-dimensional scanning with an imaging unit over a sampl...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: KAMIYAMA SHINJI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator KAMIYAMA SHINJI
description PROBLEM TO BE SOLVED: To reduce lowering of inspection efficiency which results from scanning these basic patterns in the same direction, when picking up a plurality of basic patterns not running in the main scanning direction, by performing two-dimensional scanning with an imaging unit over a sample in which the same basic pattern is repeatedly formed in two-dimensional direction, and comparing between an inspection image being an image picked up from one of these basic patterns and a reference image obtained from an image picked up from another basic pattern. SOLUTION: The inspection method includes: relatively moving a sample and an imaging unit so that two successive main scans may be performed in mutually opposite directions; storing reference images in predetermined memory circuits (21a, 21b) so that the reference images obtained from the main scanning, performed in opposite directions each other, is stored in different memory areas; and comparing an inspection image obtained from a main scan with a reference image obtained from another main scanning, performed previously directed in the same direction. COPYRIGHT: (C)2009,JPO&INPIT
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2009204410A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2009204410A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2009204410A3</originalsourceid><addsrcrecordid>eNrjZNB1cQ3zdHZVcPRzUfB1DfHwd1Fw8w9S8PQLDnB1DvH0c1fw9HV0d1VwcXUD8nkYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBgaWRgYmJoYGjMVGKANLKJWE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DEVICE AND METHOD FOR INSPECTING IMAGE DEFECT</title><source>esp@cenet</source><creator>KAMIYAMA SHINJI</creator><creatorcontrib>KAMIYAMA SHINJI</creatorcontrib><description>PROBLEM TO BE SOLVED: To reduce lowering of inspection efficiency which results from scanning these basic patterns in the same direction, when picking up a plurality of basic patterns not running in the main scanning direction, by performing two-dimensional scanning with an imaging unit over a sample in which the same basic pattern is repeatedly formed in two-dimensional direction, and comparing between an inspection image being an image picked up from one of these basic patterns and a reference image obtained from an image picked up from another basic pattern. SOLUTION: The inspection method includes: relatively moving a sample and an imaging unit so that two successive main scans may be performed in mutually opposite directions; storing reference images in predetermined memory circuits (21a, 21b) so that the reference images obtained from the main scanning, performed in opposite directions each other, is stored in different memory areas; and comparing an inspection image obtained from a main scan with a reference image obtained from another main scanning, performed previously directed in the same direction. COPYRIGHT: (C)2009,JPO&amp;INPIT</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; SEMICONDUCTOR DEVICES ; TESTING</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090910&amp;DB=EPODOC&amp;CC=JP&amp;NR=2009204410A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20090910&amp;DB=EPODOC&amp;CC=JP&amp;NR=2009204410A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAMIYAMA SHINJI</creatorcontrib><title>DEVICE AND METHOD FOR INSPECTING IMAGE DEFECT</title><description>PROBLEM TO BE SOLVED: To reduce lowering of inspection efficiency which results from scanning these basic patterns in the same direction, when picking up a plurality of basic patterns not running in the main scanning direction, by performing two-dimensional scanning with an imaging unit over a sample in which the same basic pattern is repeatedly formed in two-dimensional direction, and comparing between an inspection image being an image picked up from one of these basic patterns and a reference image obtained from an image picked up from another basic pattern. SOLUTION: The inspection method includes: relatively moving a sample and an imaging unit so that two successive main scans may be performed in mutually opposite directions; storing reference images in predetermined memory circuits (21a, 21b) so that the reference images obtained from the main scanning, performed in opposite directions each other, is stored in different memory areas; and comparing an inspection image obtained from a main scan with a reference image obtained from another main scanning, performed previously directed in the same direction. COPYRIGHT: (C)2009,JPO&amp;INPIT</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB1cQ3zdHZVcPRzUfB1DfHwd1Fw8w9S8PQLDnB1DvH0c1fw9HV0d1VwcXUD8nkYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJGBgaWRgYmJoYGjMVGKANLKJWE</recordid><startdate>20090910</startdate><enddate>20090910</enddate><creator>KAMIYAMA SHINJI</creator><scope>EVB</scope></search><sort><creationdate>20090910</creationdate><title>DEVICE AND METHOD FOR INSPECTING IMAGE DEFECT</title><author>KAMIYAMA SHINJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2009204410A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KAMIYAMA SHINJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAMIYAMA SHINJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVICE AND METHOD FOR INSPECTING IMAGE DEFECT</title><date>2009-09-10</date><risdate>2009</risdate><abstract>PROBLEM TO BE SOLVED: To reduce lowering of inspection efficiency which results from scanning these basic patterns in the same direction, when picking up a plurality of basic patterns not running in the main scanning direction, by performing two-dimensional scanning with an imaging unit over a sample in which the same basic pattern is repeatedly formed in two-dimensional direction, and comparing between an inspection image being an image picked up from one of these basic patterns and a reference image obtained from an image picked up from another basic pattern. SOLUTION: The inspection method includes: relatively moving a sample and an imaging unit so that two successive main scans may be performed in mutually opposite directions; storing reference images in predetermined memory circuits (21a, 21b) so that the reference images obtained from the main scanning, performed in opposite directions each other, is stored in different memory areas; and comparing an inspection image obtained from a main scan with a reference image obtained from another main scanning, performed previously directed in the same direction. COPYRIGHT: (C)2009,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2009204410A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
title DEVICE AND METHOD FOR INSPECTING IMAGE DEFECT
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T17%3A20%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KAMIYAMA%20SHINJI&rft.date=2009-09-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2009204410A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true