SUBSTRATE TRANSFER APPARATUS

SUBSTRATE TRANSFER APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus enabling to uniformly form a thin film, irrespective of the accuracy in design of the substrate transfer apparatus or a substrate processing apparatus. SOLUTION: The substrate transfer apparatus 1 transfers a substrate P to the substrat...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MIURA YUICHI, YOKOHAMA SHINSEI, CHISHINA HIROTSUGU, HASEGAWA KOZO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus enabling to uniformly form a thin film, irrespective of the accuracy in design of the substrate transfer apparatus or a substrate processing apparatus. SOLUTION: The substrate transfer apparatus 1 transfers a substrate P to the substrate processing apparatus 52 while allowing a substrate holding section 5 to hold the substrate P so that a surface to be processed is exposed. The substrate transfer apparatus 1 includes a substrate advancing/retracting mechanism 20 advancing and retracting the substrate holding section 5 in a substantially a normal line direction of the surface to be processed and positioning the substrate P for the substrate processing apparatus 52. COPYRIGHT: (C)2009,JPO&INPIT