SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which saves its occupancy space and can move a processing tool to a substrate in a horizontal posture so as to process the substrate. SOLUTION: The substrate processing apparatus includes: a plurality of processing units 101a and 101b...

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1. Verfasser: OTANI MASAMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which saves its occupancy space and can move a processing tool to a substrate in a horizontal posture so as to process the substrate. SOLUTION: The substrate processing apparatus includes: a plurality of processing units 101a and 101b which are provided side by side in a substantially horizontal direction and hold the substrate in an early horizontal posture; nozzles 11a and 11b for supplying a developer to the substrate W; arm members 113a and 113b for supporting the nozzles 111a and 111b; and driving units 120a and 120b for linearly moving the arm members 113a and 113b. The driving units 120a and 120b are disposed at different height positions, and overlap with each other in a plan view. The arm member 113a is so shaped not to interfere with the driving unit 120b, and can move even into a range wherein the driving unit 120a overlaps with the driving unit 120b in a plan view. Thus, the plurality of driving units 120a and 120b are provided overlapping with each other in the plan view, so the installation area is reducible. COPYRIGHT: (C)2009,JPO&INPIT