COATER AND ITS SUBSTRATE HOLDING METHOD

PROBLEM TO BE SOLVED: To provide a coater capable of suppressing the prolonging of the cycle time of the coater even when a suction force of sucking a substrate is set so as not to generate coating irregularities. SOLUTION: In the coater provided with a substrate holding means for generating the suction force at a suction hole formed on the surface of a stage, sucking the substrate to the surface of the stage and holding it, and a coating unit for discharging coating liquid while moving relatively to the substrate, the substrate holding means 40 is provided with a pressure adjustment part 41 capable of adjusting the suction force to the substrate by adjusting a pressure to be added to the substrate 10. The pressure adjustment part 41 can adjust an initial pressure of sucking the substrate immediately after being mounted on the surface of the stage and a holding pressure of maintaining the state in which the substrate is held on the surface of the stage after sucking the substrate by the initial pressure, and the holding pressure is set so as to be smaller than the initial pressure. COPYRIGHT: (C)2009,JPO&INPIT