EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an exposure apparatus used in a lithography of semiconductor integrated circuits etc. which reduces or eliminates the fluctuation of the position of the system main body caused by the deformation of a vacuum chamber. SOLUTION: The exposure apparatus includes a pole m...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	OKUBO YUKIHARU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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