EXPOSURE APPARATUS

EXPOSURE APPARATUS

PROBLEM TO BE SOLVED: To provide an exposure apparatus used in a lithography of semiconductor integrated circuits etc. which reduces or eliminates the fluctuation of the position of the system main body caused by the deformation of a vacuum chamber. SOLUTION: The exposure apparatus includes a pole m...

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1. Verfasser: OKUBO YUKIHARU
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator OKUBO YUKIHARU
description PROBLEM TO BE SOLVED: To provide an exposure apparatus used in a lithography of semiconductor integrated circuits etc. which reduces or eliminates the fluctuation of the position of the system main body caused by the deformation of a vacuum chamber. SOLUTION: The exposure apparatus includes a pole member provided upright on a foundation and a vacuum chamber containing airproof the apparatus body, and is characterized in that for allowing the displacement of a vacuum chamber upper wall from the pole member, the pole member and the vacuum chamber upper wall are resiliently connected through an elastic member. COPYRIGHT: (C)2009,JPO&INPIT
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SOLUTION: The exposure apparatus includes a pole member provided upright on a foundation and a vacuum chamber containing airproof the apparatus body, and is characterized in that for allowing the displacement of a vacuum chamber upper wall from the pole member, the pole member and the vacuum chamber upper wall are resiliently connected through an elastic member. 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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title EXPOSURE APPARATUS
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