FLUORESCENT X-RAY ANALYSIS APPARATUS, AND FLUORESCENT X-RAY ANALYSIS METHOD

PROBLEM TO BE SOLVED: To provide a fluorescent X-ray analysis apparatus and fluorescent X-ray analysis method capable of performing sensitive measurement on a wafer surface, especially near the outer periphery of the wafer surface. SOLUTION: This fluorescent X-ray analysis apparatus 1 comprises an X...

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Hauptverfasser:	MURAKAMI HIROYOSHI, NOGUCHI SACHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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creator	MURAKAMI HIROYOSHI NOGUCHI SACHIKO
description	PROBLEM TO BE SOLVED: To provide a fluorescent X-ray analysis apparatus and fluorescent X-ray analysis method capable of performing sensitive measurement on a wafer surface, especially near the outer periphery of the wafer surface. SOLUTION: This fluorescent X-ray analysis apparatus 1 comprises an X-ray beam irradiating means 2 for irradiating the wafer 6 to be measured with an X-ray beam substantially horizontally, a detecting means 3 for detecting fluorescent X-rays generated by irradiation, a signal processing section (not shown) for processing a detection result, and a positioning means 4 for holding and positioning the wafer 6. The positioning means 4 has the wafer 6 to be measured, and positions a detection region 8 by the detecting means 3, by moving the wafer 6, to a position avoiding a scattered light generating region 10 where the X-ray beam 7 is made to come to the outer peripheral surface of the wafer 6 to generate scattered light. COPYRIGHT: (C)2009,JPO&INPIT
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subjects	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
title	FLUORESCENT X-RAY ANALYSIS APPARATUS, AND FLUORESCENT X-RAY ANALYSIS METHOD
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