SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To more simply manufacture a semiconductor device which generates different stress in MIS (metal-insulator semiconductor) transistors having different conduction types. SOLUTION: A stress distortion generating film 27 is formed on the n-type transistor region A of a semiconduct...

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Bibliographische Detailangaben
1. Verfasser: FUJIMOTO HIROMASA
Format: Patent
Sprache:eng
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