PHOTOSENSITIVE RESIN COMPOSITION, AND SCREEN PRINTING PLATE AND METHOD FOR PRODUCING SCREEN PRINTING PLATE USING THE SAME

PROBLEM TO BE SOLVED: To provide a screen printing plate capable of producing a printed circuit board having a linewidth of wiring of about 10 μm and a high aspect ratio, to provide a method for producing the screen printing plate, and to provide a photosensitive resin composition used for producing...

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Hauptverfasser:	TAKADA KOHEI, SHIRAI MASAMITSU, MURAMATSU KEIKO, YAMASHITA MUNEAKI, KASHIWAGI MINORU, NAKAJIRI HIDEYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING TYPEWRITERS
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creator	TAKADA KOHEI SHIRAI MASAMITSU MURAMATSU KEIKO YAMASHITA MUNEAKI KASHIWAGI MINORU NAKAJIRI HIDEYUKI
description	PROBLEM TO BE SOLVED: To provide a screen printing plate capable of producing a printed circuit board having a linewidth of wiring of about 10 μm and a high aspect ratio, to provide a method for producing the screen printing plate, and to provide a photosensitive resin composition used for producing the screen printing plate. SOLUTION: The photosensitive resin composition comprises (1) a methacrylate-based copolymer containing a structural unit represented by formula (I), (2) a photoradical initiator, (3) a photoacid generator capable of generating an acid upon irradiation with light different in wavelength region from light which allows the photoradical generator to generate a radical, and (4) a crosslinking agent which causes a crosslinking reaction under the radical. COPYRIGHT: (C)2009,JPO&INPIT
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2009048163A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2009048163A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2009048163A3</originalsourceid><addsrcrecordid>eNqNijELwjAQRrs4iPofDmeFaqXoGNKridi7kFxdS5E4iRbq4r_XiqOD0_f43hsnT2dYOCAFK_aE4DFYAs2V4-FhWoCiAoL2iATOWxJLe3BHJfgxFYrhAkr2b8tFrQf9O6_DwGIQgqpwmowu7bWPs-9OknmJos0ydvcm9l17jrf4aA5unaa7dLNd5ZnK_opeepQ64w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTOSENSITIVE RESIN COMPOSITION, AND SCREEN PRINTING PLATE AND METHOD FOR PRODUCING SCREEN PRINTING PLATE USING THE SAME</title><source>esp@cenet</source><creator>TAKADA KOHEI ; SHIRAI MASAMITSU ; MURAMATSU KEIKO ; YAMASHITA MUNEAKI ; KASHIWAGI MINORU ; NAKAJIRI HIDEYUKI</creator><creatorcontrib>TAKADA KOHEI ; SHIRAI MASAMITSU ; MURAMATSU KEIKO ; YAMASHITA MUNEAKI ; KASHIWAGI MINORU ; NAKAJIRI HIDEYUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a screen printing plate capable of producing a printed circuit board having a linewidth of wiring of about 10 μm and a high aspect ratio, to provide a method for producing the screen printing plate, and to provide a photosensitive resin composition used for producing the screen printing plate. SOLUTION: The photosensitive resin composition comprises (1) a methacrylate-based copolymer containing a structural unit represented by formula (I), (2) a photoradical initiator, (3) a photoacid generator capable of generating an acid upon irradiation with light different in wavelength region from light which allows the photoradical generator to generate a radical, and (4) a crosslinking agent which causes a crosslinking reaction under the radical. COPYRIGHT: (C)2009,JPO&INPIT</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; LINING MACHINES ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM ; PRINTING ; PRINTING PLATES OR FOILS ; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES ; STAMPS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2009</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090305&DB=EPODOC&CC=JP&NR=2009048163A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20090305&DB=EPODOC&CC=JP&NR=2009048163A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAKADA KOHEI</creatorcontrib><creatorcontrib>SHIRAI MASAMITSU</creatorcontrib><creatorcontrib>MURAMATSU KEIKO</creatorcontrib><creatorcontrib>YAMASHITA MUNEAKI</creatorcontrib><creatorcontrib>KASHIWAGI MINORU</creatorcontrib><creatorcontrib>NAKAJIRI HIDEYUKI</creatorcontrib><title>PHOTOSENSITIVE RESIN COMPOSITION, AND SCREEN PRINTING PLATE AND METHOD FOR PRODUCING SCREEN PRINTING PLATE USING THE SAME</title><description>PROBLEM TO BE SOLVED: To provide a screen printing plate capable of producing a printed circuit board having a linewidth of wiring of about 10 μm and a high aspect ratio, to provide a method for producing the screen printing plate, and to provide a photosensitive resin composition used for producing the screen printing plate. SOLUTION: The photosensitive resin composition comprises (1) a methacrylate-based copolymer containing a structural unit represented by formula (I), (2) a photoradical initiator, (3) a photoacid generator capable of generating an acid upon irradiation with light different in wavelength region from light which allows the photoradical generator to generate a radical, and (4) a crosslinking agent which causes a crosslinking reaction under the radical. COPYRIGHT: (C)2009,JPO&INPIT</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>LINING MACHINES</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM</subject><subject>PRINTING</subject><subject>PRINTING PLATES OR FOILS</subject><subject>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</subject><subject>STAMPS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2009</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNijELwjAQRrs4iPofDmeFaqXoGNKridi7kFxdS5E4iRbq4r_XiqOD0_f43hsnT2dYOCAFK_aE4DFYAs2V4-FhWoCiAoL2iATOWxJLe3BHJfgxFYrhAkr2b8tFrQf9O6_DwGIQgqpwmowu7bWPs-9OknmJos0ydvcm9l17jrf4aA5unaa7dLNd5ZnK_opeepQ64w</recordid><startdate>20090305</startdate><enddate>20090305</enddate><creator>TAKADA KOHEI</creator><creator>SHIRAI MASAMITSU</creator><creator>MURAMATSU KEIKO</creator><creator>YAMASHITA MUNEAKI</creator><creator>KASHIWAGI MINORU</creator><creator>NAKAJIRI HIDEYUKI</creator><scope>EVB</scope></search><sort><creationdate>20090305</creationdate><title>PHOTOSENSITIVE RESIN COMPOSITION, AND SCREEN PRINTING PLATE AND METHOD FOR PRODUCING SCREEN PRINTING PLATE USING THE SAME</title><author>TAKADA KOHEI ; SHIRAI MASAMITSU ; MURAMATSU KEIKO ; YAMASHITA MUNEAKI ; KASHIWAGI MINORU ; NAKAJIRI HIDEYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2009048163A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2009</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>LINING MACHINES</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM</topic><topic>PRINTING</topic><topic>PRINTING PLATES OR FOILS</topic><topic>PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES</topic><topic>STAMPS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>TAKADA KOHEI</creatorcontrib><creatorcontrib>SHIRAI MASAMITSU</creatorcontrib><creatorcontrib>MURAMATSU KEIKO</creatorcontrib><creatorcontrib>YAMASHITA MUNEAKI</creatorcontrib><creatorcontrib>KASHIWAGI MINORU</creatorcontrib><creatorcontrib>NAKAJIRI HIDEYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAKADA KOHEI</au><au>SHIRAI MASAMITSU</au><au>MURAMATSU KEIKO</au><au>YAMASHITA MUNEAKI</au><au>KASHIWAGI MINORU</au><au>NAKAJIRI HIDEYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTOSENSITIVE RESIN COMPOSITION, AND SCREEN PRINTING PLATE AND METHOD FOR PRODUCING SCREEN PRINTING PLATE USING THE SAME</title><date>2009-03-05</date><risdate>2009</risdate><abstract>PROBLEM TO BE SOLVED: To provide a screen printing plate capable of producing a printed circuit board having a linewidth of wiring of about 10 μm and a high aspect ratio, to provide a method for producing the screen printing plate, and to provide a photosensitive resin composition used for producing the screen printing plate. SOLUTION: The photosensitive resin composition comprises (1) a methacrylate-based copolymer containing a structural unit represented by formula (I), (2) a photoradical initiator, (3) a photoacid generator capable of generating an acid upon irradiation with light different in wavelength region from light which allows the photoradical generator to generate a radical, and (4) a crosslinking agent which causes a crosslinking reaction under the radical. COPYRIGHT: (C)2009,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record>
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language	eng
recordid	cdi_epo_espacenet_JP2009048163A
source	esp@cenet
subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING PLATES OR FOILS PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES STAMPS THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING TYPEWRITERS
title	PHOTOSENSITIVE RESIN COMPOSITION, AND SCREEN PRINTING PLATE AND METHOD FOR PRODUCING SCREEN PRINTING PLATE USING THE SAME
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T18%3A15%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TAKADA%20KOHEI&rft.date=2009-03-05&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2009048163A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true