EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CLEANING METHOD FOR EXTREME ULTRAVIOLET LIGHT CONVERGING MIRROR

PROBLEM TO BE SOLVED: To remove debris by enabling a cleaning means to act efficiently on a portion contaminated with the debris caused by a metal or a metal compound, in an extreme ultraviolet light converging mirror. SOLUTION: Power is supplied between a first electrode 11 and a second electrode 1...

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1. Verfasser:	YABUTA YASUNOBU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
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creator	YABUTA YASUNOBU
description	PROBLEM TO BE SOLVED: To remove debris by enabling a cleaning means to act efficiently on a portion contaminated with the debris caused by a metal or a metal compound, in an extreme ultraviolet light converging mirror. SOLUTION: Power is supplied between a first electrode 11 and a second electrode 12 from a pulse power supply 15 to generate a high temperature plasma P in a discharge part 1. An EUV light is emitted thereby. The EUV light is emitted from an EUV light extracting part 7 via the converging mirror 2. At the same time as this, the debris containing tin, etc. is emitted from the discharge part 1, and a part of this reaches the converging mirror 2 and sticks to a reflecting surface. A cleaning gas supply unit 5 and a radical generating part 6 are installed at a light emitting side of the converging mirror 2, and a non-reflective surface 2b of the converging mirror 2 is covered with an insulating material. Even when a hydrogen radical is brought into contact with the non-reflective surface 2b, etc., therefore, it can react with the debris containing tin, etc. stuck and deposited on the converging mirror without deactivating, so that cleaning is performed efficiently. COPYRIGHT: (C)2009,JPO&INPIT
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SOLUTION: Power is supplied between a first electrode 11 and a second electrode 12 from a pulse power supply 15 to generate a high temperature plasma P in a discharge part 1. An EUV light is emitted thereby. The EUV light is emitted from an EUV light extracting part 7 via the converging mirror 2. At the same time as this, the debris containing tin, etc. is emitted from the discharge part 1, and a part of this reaches the converging mirror 2 and sticks to a reflecting surface. A cleaning gas supply unit 5 and a radical generating part 6 are installed at a light emitting side of the converging mirror 2, and a non-reflective surface 2b of the converging mirror 2 is covered with an insulating material. Even when a hydrogen radical is brought into contact with the non-reflective surface 2b, etc., therefore, it can react with the debris containing tin, etc. stuck and deposited on the converging mirror without deactivating, so that cleaning is performed efficiently. 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subjects	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR X-RAY TECHNIQUE
title	EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CLEANING METHOD FOR EXTREME ULTRAVIOLET LIGHT CONVERGING MIRROR
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