COMPOSITION FOR COLORED PATTERN FORMATION, COLORED PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY DEVICE

PROBLEM TO BE SOLVED: To provide a composition for colored pattern formation and a colored pattern forming method by which even when a slit coating speed on a glass substrate is set to such a high value as ≥200 mm/s in order to manufacture a color filter, coating defects are avoided and such good co...

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description PROBLEM TO BE SOLVED: To provide a composition for colored pattern formation and a colored pattern forming method by which even when a slit coating speed on a glass substrate is set to such a high value as ≥200 mm/s in order to manufacture a color filter, coating defects are avoided and such good color properties as high color purity and high contrast can be ensured for an obtained color filter. SOLUTION: The composition for colored pattern formation comprises (A) a pigment, (B) a compound having an ethylenically unsaturated group, (C) a photopolymerization initiator and (D) a dispersed resin, wherein when a viscosity of the composition for colored pattern formation at 23°C is represented by η(mPa s) and a forward contact angle of the composition for colored pattern formation to a glass substrate is represented by θa(°), the expression (1): 30≤η×θa≤40 (wherein 2≤η≤3) is satisfied. COPYRIGHT: (C)2009,JPO&INPIT
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SOLUTION: The composition for colored pattern formation comprises (A) a pigment, (B) a compound having an ethylenically unsaturated group, (C) a photopolymerization initiator and (D) a dispersed resin, wherein when a viscosity of the composition for colored pattern formation at 23°C is represented by η(mPa s) and a forward contact angle of the composition for colored pattern formation to a glass substrate is represented by θa(°), the expression (1): 30≤η×θa≤40 (wherein 2≤η≤3) is satisfied. 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SOLUTION: The composition for colored pattern formation comprises (A) a pigment, (B) a compound having an ethylenically unsaturated group, (C) a photopolymerization initiator and (D) a dispersed resin, wherein when a viscosity of the composition for colored pattern formation at 23°C is represented by η(mPa s) and a forward contact angle of the composition for colored pattern formation to a glass substrate is represented by θa(°), the expression (1): 30≤η×θa≤40 (wherein 2≤η≤3) is satisfied. 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SOLUTION: The composition for colored pattern formation comprises (A) a pigment, (B) a compound having an ethylenically unsaturated group, (C) a photopolymerization initiator and (D) a dispersed resin, wherein when a viscosity of the composition for colored pattern formation at 23°C is represented by η(mPa s) and a forward contact angle of the composition for colored pattern formation to a glass substrate is represented by θa(°), the expression (1): 30≤η×θa≤40 (wherein 2≤η≤3) is satisfied. COPYRIGHT: (C)2009,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
CINEMATOGRAPHY
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTROGRAPHY
FREQUENCY-CHANGING
HOLOGRAPHY
MATERIALS THEREFOR
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
SPRAYING OR ATOMISING IN GENERAL
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
TRANSPORTING
title COMPOSITION FOR COLORED PATTERN FORMATION, COLORED PATTERN FORMING METHOD, METHOD FOR MANUFACTURING COLOR FILTER, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY DEVICE
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