VAPOR DRYER
PROBLEM TO BE SOLVED: To provide a vapor dryer reducing residual foreign matters and suppressing generation of stain like watermark when drying using an organic solvent like IPA. SOLUTION: Watermark or foreign matter residue is moved to a lower side chamfer part for cooling drying by raising up a co...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | RATTRAY BRIAN |
| description | PROBLEM TO BE SOLVED: To provide a vapor dryer reducing residual foreign matters and suppressing generation of stain like watermark when drying using an organic solvent like IPA. SOLUTION: Watermark or foreign matter residue is moved to a lower side chamfer part for cooling drying by raising up a condensed disc to a cooling area at a speed of dripping only from the lower side chamfer part. By re-dipping the lower side chamfer part into a vapor area, residual foreign matters of the lower side chamfer part is washed down by drain to the residual part of the watermark and foreign matters moved to the lower side chamfer part, and trace of the watermark supposed to occur in the lower side chamfer part is removed to dry the disc by raising up again. COPYRIGHT: (C)2009,JPO&INPIT |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008264690A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008264690A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008264690A3</originalsourceid><addsrcrecordid>eNrjZOAOcwzwD1JwCYp0DeJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBhZGZiZmlgaOxkQpAgCuxRye</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>VAPOR DRYER</title><source>esp@cenet</source><creator>RATTRAY BRIAN</creator><creatorcontrib>RATTRAY BRIAN</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a vapor dryer reducing residual foreign matters and suppressing generation of stain like watermark when drying using an organic solvent like IPA. SOLUTION: Watermark or foreign matter residue is moved to a lower side chamfer part for cooling drying by raising up a condensed disc to a cooling area at a speed of dripping only from the lower side chamfer part. By re-dipping the lower side chamfer part into a vapor area, residual foreign matters of the lower side chamfer part is washed down by drain to the residual part of the watermark and foreign matters moved to the lower side chamfer part, and trace of the watermark supposed to occur in the lower side chamfer part is removed to dry the disc by raising up again. COPYRIGHT: (C)2009,JPO&INPIT</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; CLEANING ; CLEANING IN GENERAL ; DRYING ; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; SEMICONDUCTOR DEVICES ; TRANSPORTING ; WEAPONS</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081106&DB=EPODOC&CC=JP&NR=2008264690A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081106&DB=EPODOC&CC=JP&NR=2008264690A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RATTRAY BRIAN</creatorcontrib><title>VAPOR DRYER</title><description>PROBLEM TO BE SOLVED: To provide a vapor dryer reducing residual foreign matters and suppressing generation of stain like watermark when drying using an organic solvent like IPA. SOLUTION: Watermark or foreign matter residue is moved to a lower side chamfer part for cooling drying by raising up a condensed disc to a cooling area at a speed of dripping only from the lower side chamfer part. By re-dipping the lower side chamfer part into a vapor area, residual foreign matters of the lower side chamfer part is washed down by drain to the residual part of the watermark and foreign matters moved to the lower side chamfer part, and trace of the watermark supposed to occur in the lower side chamfer part is removed to dry the disc by raising up again. COPYRIGHT: (C)2009,JPO&INPIT</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>DRYING</subject><subject>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOAOcwzwD1JwCYp0DeJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBhZGZiZmlgaOxkQpAgCuxRye</recordid><startdate>20081106</startdate><enddate>20081106</enddate><creator>RATTRAY BRIAN</creator><scope>EVB</scope></search><sort><creationdate>20081106</creationdate><title>VAPOR DRYER</title><author>RATTRAY BRIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008264690A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>DRYING</topic><topic>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>RATTRAY BRIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RATTRAY BRIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VAPOR DRYER</title><date>2008-11-06</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To provide a vapor dryer reducing residual foreign matters and suppressing generation of stain like watermark when drying using an organic solvent like IPA. SOLUTION: Watermark or foreign matter residue is moved to a lower side chamfer part for cooling drying by raising up a condensed disc to a cooling area at a speed of dripping only from the lower side chamfer part. By re-dipping the lower side chamfer part into a vapor area, residual foreign matters of the lower side chamfer part is washed down by drain to the residual part of the watermark and foreign matters moved to the lower side chamfer part, and trace of the watermark supposed to occur in the lower side chamfer part is removed to dry the disc by raising up again. COPYRIGHT: (C)2009,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2008264690A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS BLASTING CLEANING CLEANING IN GENERAL DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING WEAPONS |
| title | VAPOR DRYER |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T15%3A37%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RATTRAY%20BRIAN&rft.date=2008-11-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2008264690A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |