LAMP HEATING TYPE THERMAL CVD APPARATUS

PROBLEM TO BE SOLVED: To provide a lamp heating type thermal CVD apparatus which has enhanced yield by efficiently depositing a CVD film. SOLUTION: The lamp heating type thermal CVD apparatus is used for depositing a film by a thermal CVD method on a substrate 3. The apparatus includes: a chamber 1;...

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Bibliographische Detailangaben
Hauptverfasser:	KAWABE TAKEHARU, HONDA YUJI, SHIRATO TAKESHI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lamp heating type thermal CVD apparatus which has enhanced yield by efficiently depositing a CVD film. SOLUTION: The lamp heating type thermal CVD apparatus is used for depositing a film by a thermal CVD method on a substrate 3. The apparatus includes: a chamber 1; lamp heaters 4, 5 which are arranged outside the chamber 1 and irradiates the substrate 3 with the lamp light transmitted by the chamber 1; a raw material gas introducing mechanism which is connected to the chamber 1 and introduces the raw material gas into the chamber 1; an exhaust port 21 which is prepared in the chamber 1 and exhausts the inside of the chamber 1; and an exhaust mechanism 1 which is connected to the exhaust port 21. COPYRIGHT: (C)2009,JPO&INPIT