CONTINUOUS APPLICATION METHOD AND CONTINUOUS APPLICATION EQUIPMENT

PROBLEM TO BE SOLVED: To provide a continuous application method capable of suppressing the generation of application defects while adjusting the amount of deposit after drying within a range required from points of corrosion resistance or the like, and continuous application equipment. SOLUTION: Th...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MORIKAWA YASUTAKA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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