SUBSTRATE HOLDER, FILM DEPOSITION APPARATUS, AND FILM DEPOSITION METHOD

PROBLEM TO BE SOLVED: To realize a film deposition apparatus of high film deposition efficiency relating to a substrate holder in a vacuum vapor deposition, a film deposition apparatus, and a film deposition method. SOLUTION: The substrate holder 50 which holds a plurality of the substrates W on the...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	TAKIMOTO MASAYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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