POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE
PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a f...
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| creator | MOGI AKIO KONNO TADAO KONOUE HAJIME SUZUKI TATSUYUKI |
| description | PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a fixing abrasive polishing sheet 23 as a polishing pad is adhered, is pressed to a surface of a glass substrate, on which a film is formed, a polishing plate is orbitally moved to the glass substrate, so as to polish the film on the surface of the glass substrate by the fixing abrasive polishing sheet. A clearance-adjusting pad 24 for keeping an optimum clearance between the surface of the glass substrate and the fixing abrasive polishing sheet by contacting the surface of the glass substrate before the fixing abrasive polishing sheet 23 and being smashed and deformed according to a pressing force when the polishing plate is pressed to the surface, is provided on the polishing surface plate face of the polishing plate. COPYRIGHT: (C)2009,JPO&INPIT |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008238365A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008238365A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008238365A3</originalsourceid><addsrcrecordid>eNrjZKgO8PfxDPbw9HNX8HV0BtKuCv5uCu4-jsHBCsGhTsEhQY4hrjoKAUH-LqHOIZ7-fgo-2NUohHuGeCi4efr46ig4-rkoIJnrGuLh74JFCw8Da1piTnEqL5TmZlBycw1x9tBNLciPTy0uSExOzUstifcKMDIwsDAytjA2M3U0JkoRAK9aOzI</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE</title><source>esp@cenet</source><creator>MOGI AKIO ; KONNO TADAO ; KONOUE HAJIME ; SUZUKI TATSUYUKI</creator><creatorcontrib>MOGI AKIO ; KONNO TADAO ; KONOUE HAJIME ; SUZUKI TATSUYUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a fixing abrasive polishing sheet 23 as a polishing pad is adhered, is pressed to a surface of a glass substrate, on which a film is formed, a polishing plate is orbitally moved to the glass substrate, so as to polish the film on the surface of the glass substrate by the fixing abrasive polishing sheet. A clearance-adjusting pad 24 for keeping an optimum clearance between the surface of the glass substrate and the fixing abrasive polishing sheet by contacting the surface of the glass substrate before the fixing abrasive polishing sheet 23 and being smashed and deformed according to a pressing force when the polishing plate is pressed to the surface, is provided on the polishing surface plate face of the polishing plate. COPYRIGHT: (C)2009,JPO&INPIT</description><language>eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081009&DB=EPODOC&CC=JP&NR=2008238365A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20081009&DB=EPODOC&CC=JP&NR=2008238365A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MOGI AKIO</creatorcontrib><creatorcontrib>KONNO TADAO</creatorcontrib><creatorcontrib>KONOUE HAJIME</creatorcontrib><creatorcontrib>SUZUKI TATSUYUKI</creatorcontrib><title>POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE</title><description>PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a fixing abrasive polishing sheet 23 as a polishing pad is adhered, is pressed to a surface of a glass substrate, on which a film is formed, a polishing plate is orbitally moved to the glass substrate, so as to polish the film on the surface of the glass substrate by the fixing abrasive polishing sheet. A clearance-adjusting pad 24 for keeping an optimum clearance between the surface of the glass substrate and the fixing abrasive polishing sheet by contacting the surface of the glass substrate before the fixing abrasive polishing sheet 23 and being smashed and deformed according to a pressing force when the polishing plate is pressed to the surface, is provided on the polishing surface plate face of the polishing plate. COPYRIGHT: (C)2009,JPO&INPIT</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgO8PfxDPbw9HNX8HV0BtKuCv5uCu4-jsHBCsGhTsEhQY4hrjoKAUH-LqHOIZ7-fgo-2NUohHuGeCi4efr46ig4-rkoIJnrGuLh74JFCw8Da1piTnEqL5TmZlBycw1x9tBNLciPTy0uSExOzUstifcKMDIwsDAytjA2M3U0JkoRAK9aOzI</recordid><startdate>20081009</startdate><enddate>20081009</enddate><creator>MOGI AKIO</creator><creator>KONNO TADAO</creator><creator>KONOUE HAJIME</creator><creator>SUZUKI TATSUYUKI</creator><scope>EVB</scope></search><sort><creationdate>20081009</creationdate><title>POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE</title><author>MOGI AKIO ; KONNO TADAO ; KONOUE HAJIME ; SUZUKI TATSUYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008238365A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MOGI AKIO</creatorcontrib><creatorcontrib>KONNO TADAO</creatorcontrib><creatorcontrib>KONOUE HAJIME</creatorcontrib><creatorcontrib>SUZUKI TATSUYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MOGI AKIO</au><au>KONNO TADAO</au><au>KONOUE HAJIME</au><au>SUZUKI TATSUYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE</title><date>2008-10-09</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a fixing abrasive polishing sheet 23 as a polishing pad is adhered, is pressed to a surface of a glass substrate, on which a film is formed, a polishing plate is orbitally moved to the glass substrate, so as to polish the film on the surface of the glass substrate by the fixing abrasive polishing sheet. A clearance-adjusting pad 24 for keeping an optimum clearance between the surface of the glass substrate and the fixing abrasive polishing sheet by contacting the surface of the glass substrate before the fixing abrasive polishing sheet 23 and being smashed and deformed according to a pressing force when the polishing plate is pressed to the surface, is provided on the polishing surface plate face of the polishing plate. COPYRIGHT: (C)2009,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE |
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