POLISHING MACHINE OF GLASS SUBSTRATE, PRODUCTION LINE OF GLASS SUBSTRATE WITH FILM, AND POLISHING METHOD OF GLASS SUBSTRATE
PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a f...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To remove only all of abnormal protrusions by polishing for a short time without reducing a film thickness of a normal film thickness portion. SOLUTION: In this polishing machine of a glass substrate, while a polishing plate 20 to a polishing surface plate face 20a of which a fixing abrasive polishing sheet 23 as a polishing pad is adhered, is pressed to a surface of a glass substrate, on which a film is formed, a polishing plate is orbitally moved to the glass substrate, so as to polish the film on the surface of the glass substrate by the fixing abrasive polishing sheet. A clearance-adjusting pad 24 for keeping an optimum clearance between the surface of the glass substrate and the fixing abrasive polishing sheet by contacting the surface of the glass substrate before the fixing abrasive polishing sheet 23 and being smashed and deformed according to a pressing force when the polishing plate is pressed to the surface, is provided on the polishing surface plate face of the polishing plate. COPYRIGHT: (C)2009,JPO&INPIT |
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