ANTIREFLECTION STRUCTURE
PROBLEM TO BE SOLVED: To provide an antireflection structure in which the production of rugged periodical structural layers is facilitated, which has high mechanical strength and excellent antireflection performance, in which the selective range of materials usable for the rugged periodical structur...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | PROBLEM TO BE SOLVED: To provide an antireflection structure in which the production of rugged periodical structural layers is facilitated, which has high mechanical strength and excellent antireflection performance, in which the selective range of materials usable for the rugged periodical structural layers is wide as well, and which can impart antireflection performance to various base materials. SOLUTION: In the antireflection structure, on a base material having permeability to the light to be used, rugged periodical structural layers, each composed of a material having a refractive index higher than that of the base material and having a fine projecting group are formed at the period less than the wavelength of the light. COPYRIGHT: (C)2008,JPO&INPIT |
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