TREATMENT METHOD AND STORAGE MEDIUM

TREATMENT METHOD AND STORAGE MEDIUM

PROBLEM TO BE SOLVED: To provide a treatment method which maintains a fine process characteristic and simultaneously can perform a serialization process at higher throughput than that of a conventional one. SOLUTION: In this treatment method, after a treatment board is carried into a treatment chamb...

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Hauptverfasser: ASAKO RYUICHI, KUBOTA KAZUHIRO, HOSHI NAOTADA, CHIBA YUUKI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator ASAKO RYUICHI
KUBOTA KAZUHIRO
HOSHI NAOTADA
CHIBA YUUKI
description PROBLEM TO BE SOLVED: To provide a treatment method which maintains a fine process characteristic and simultaneously can perform a serialization process at higher throughput than that of a conventional one. SOLUTION: In this treatment method, after a treatment board is carried into a treatment chamber, gas having a coupling with Si and CH3is introduced into the treatment chamber, and the serialization process is performed to the treatment board. The gas having the coupling with Si and CH3is supplied into the treatment chamber to raise the pressure of the treatment chamber, and while the pressure of the treatment chamber is lowered after reaching given pressure down to carry-out pressure, the pressure of the treatment chamber and a supply time period in supplying the gas having the coupling with Si and CH3are set to a range in which a predetermined serialization process can be performed. COPYRIGHT: (C)2008,JPO&INPIT
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title TREATMENT METHOD AND STORAGE MEDIUM
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