ARC DISCHARGE IDENTIFICATION METHOD, ARC DISCHARGE IDENTIFICATION DEVICE AND PLASMA POWER-FEEDING UNIT
PROBLEM TO BE SOLVED: To provide an identification method of arc discharge in which a requirement for a high treatment quality without lowering a treatment ratio excessively, an arc discharge identification device and a plasma power-feeding unit. SOLUTION: In the arc discharge identification method...
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| creator | ZAHRINGER GERHARD |
| description | PROBLEM TO BE SOLVED: To provide an identification method of arc discharge in which a requirement for a high treatment quality without lowering a treatment ratio excessively, an arc discharge identification device and a plasma power-feeding unit. SOLUTION: In the arc discharge identification method in a plasma process, a characteristic volume KG of a plasma process for identification of arc discharge generated in plasma is monitored, and after a standby for a first time duration t1 after identification of the arc discharge, the characteristic volume KG is inspected again. When the arc discharge is not identified after a lapse of the first time duration t1, a first countermeasure for controlling the arc discharge is carried out. COPYRIGHT: (C)2008,JPO&INPIT |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008166263A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008166263A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008166263A3</originalsourceid><addsrcrecordid>eNqNyrEKwjAQANAsDqL-w-FsobYQuh7JpTmxSUijjqVIOokW6v_j4ixOb3lrMWFUoLlXFmNLwJpcYsMKE3sHHSXr9QF-Jk1XVgToNIQz9h1C8DeKhSHS7Fq4OE5bsZrGx5J3XzdibygpW-T5NeRlHu_5md_DKVRl2RylrGSN9V_pA9yvNRM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ARC DISCHARGE IDENTIFICATION METHOD, ARC DISCHARGE IDENTIFICATION DEVICE AND PLASMA POWER-FEEDING UNIT</title><source>esp@cenet</source><creator>ZAHRINGER GERHARD</creator><creatorcontrib>ZAHRINGER GERHARD</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an identification method of arc discharge in which a requirement for a high treatment quality without lowering a treatment ratio excessively, an arc discharge identification device and a plasma power-feeding unit. SOLUTION: In the arc discharge identification method in a plasma process, a characteristic volume KG of a plasma process for identification of arc discharge generated in plasma is monitored, and after a standby for a first time duration t1 after identification of the arc discharge, the characteristic volume KG is inspected again. When the arc discharge is not identified after a lapse of the first time duration t1, a first countermeasure for controlling the arc discharge is carried out. COPYRIGHT: (C)2008,JPO&INPIT</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080717&DB=EPODOC&CC=JP&NR=2008166263A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080717&DB=EPODOC&CC=JP&NR=2008166263A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZAHRINGER GERHARD</creatorcontrib><title>ARC DISCHARGE IDENTIFICATION METHOD, ARC DISCHARGE IDENTIFICATION DEVICE AND PLASMA POWER-FEEDING UNIT</title><description>PROBLEM TO BE SOLVED: To provide an identification method of arc discharge in which a requirement for a high treatment quality without lowering a treatment ratio excessively, an arc discharge identification device and a plasma power-feeding unit. SOLUTION: In the arc discharge identification method in a plasma process, a characteristic volume KG of a plasma process for identification of arc discharge generated in plasma is monitored, and after a standby for a first time duration t1 after identification of the arc discharge, the characteristic volume KG is inspected again. When the arc discharge is not identified after a lapse of the first time duration t1, a first countermeasure for controlling the arc discharge is carried out. COPYRIGHT: (C)2008,JPO&INPIT</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQANAsDqL-w-FsobYQuh7JpTmxSUijjqVIOokW6v_j4ixOb3lrMWFUoLlXFmNLwJpcYsMKE3sHHSXr9QF-Jk1XVgToNIQz9h1C8DeKhSHS7Fq4OE5bsZrGx5J3XzdibygpW-T5NeRlHu_5md_DKVRl2RylrGSN9V_pA9yvNRM</recordid><startdate>20080717</startdate><enddate>20080717</enddate><creator>ZAHRINGER GERHARD</creator><scope>EVB</scope></search><sort><creationdate>20080717</creationdate><title>ARC DISCHARGE IDENTIFICATION METHOD, ARC DISCHARGE IDENTIFICATION DEVICE AND PLASMA POWER-FEEDING UNIT</title><author>ZAHRINGER GERHARD</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008166263A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>ZAHRINGER GERHARD</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZAHRINGER GERHARD</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ARC DISCHARGE IDENTIFICATION METHOD, ARC DISCHARGE IDENTIFICATION DEVICE AND PLASMA POWER-FEEDING UNIT</title><date>2008-07-17</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To provide an identification method of arc discharge in which a requirement for a high treatment quality without lowering a treatment ratio excessively, an arc discharge identification device and a plasma power-feeding unit. SOLUTION: In the arc discharge identification method in a plasma process, a characteristic volume KG of a plasma process for identification of arc discharge generated in plasma is monitored, and after a standby for a first time duration t1 after identification of the arc discharge, the characteristic volume KG is inspected again. When the arc discharge is not identified after a lapse of the first time duration t1, a first countermeasure for controlling the arc discharge is carried out. COPYRIGHT: (C)2008,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | ARC DISCHARGE IDENTIFICATION METHOD, ARC DISCHARGE IDENTIFICATION DEVICE AND PLASMA POWER-FEEDING UNIT |
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