DEVELOPMENT PROCESSOR

PROBLEM TO BE SOLVED: To provide a development processor, by which a running cost can be reduced while removing scum and a cost for a capacity investment can be cut. SOLUTION: Developer 3 after performing a development processing in a development processing portion 5 is made to flow into a developin...

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Hauptverfasser: NOMA HIROSHI, KAMIMURA KAZUHIDE
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KAMIMURA KAZUHIDE
description PROBLEM TO BE SOLVED: To provide a development processor, by which a running cost can be reduced while removing scum and a cost for a capacity investment can be cut. SOLUTION: Developer 3 after performing a development processing in a development processing portion 5 is made to flow into a developing tank 1. At this time, bubbles 9 to which the scum sticks are generated on the surface of the developer 3. The bubbles 9 generated one after another have their escape cut off and are naturally pushed out upwardly in a narrow space partitioned with a division plate 6. That is, by providing the division plate 6 to reduce the volume of a space where the bubbles 9 can exist, a pushing force of the bubbles 9 themselves is increased and the bubbles 9 move above the developing tank 1 according to natural pushing force generated in the bubbles 9 themselves. The bubbles 9 are naturally ejected to piping 7 from an upper part of the developing tank 1. The ejected bubbles 9 go into a scum removing portion 8, and the bubbles 9 to which the scum sticks are removed from a waste line. COPYRIGHT: (C)2008,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008159921A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008159921A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008159921A3</originalsourceid><addsrcrecordid>eNrjZBB1cQ1z9fEP8HX1C1EICPJ3dg0O9g_iYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYWhqaWlkaGjsZEKQIA7fEfnQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DEVELOPMENT PROCESSOR</title><source>esp@cenet</source><creator>NOMA HIROSHI ; KAMIMURA KAZUHIDE</creator><creatorcontrib>NOMA HIROSHI ; KAMIMURA KAZUHIDE</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a development processor, by which a running cost can be reduced while removing scum and a cost for a capacity investment can be cut. SOLUTION: Developer 3 after performing a development processing in a development processing portion 5 is made to flow into a developing tank 1. At this time, bubbles 9 to which the scum sticks are generated on the surface of the developer 3. The bubbles 9 generated one after another have their escape cut off and are naturally pushed out upwardly in a narrow space partitioned with a division plate 6. That is, by providing the division plate 6 to reduce the volume of a space where the bubbles 9 can exist, a pushing force of the bubbles 9 themselves is increased and the bubbles 9 move above the developing tank 1 according to natural pushing force generated in the bubbles 9 themselves. The bubbles 9 are naturally ejected to piping 7 from an upper part of the developing tank 1. The ejected bubbles 9 go into a scum removing portion 8, and the bubbles 9 to which the scum sticks are removed from a waste line. COPYRIGHT: (C)2008,JPO&amp;INPIT</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PHYSICS ; SEMICONDUCTOR DEVICES ; SEPARATION ; TRANSPORTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080710&amp;DB=EPODOC&amp;CC=JP&amp;NR=2008159921A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080710&amp;DB=EPODOC&amp;CC=JP&amp;NR=2008159921A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NOMA HIROSHI</creatorcontrib><creatorcontrib>KAMIMURA KAZUHIDE</creatorcontrib><title>DEVELOPMENT PROCESSOR</title><description>PROBLEM TO BE SOLVED: To provide a development processor, by which a running cost can be reduced while removing scum and a cost for a capacity investment can be cut. SOLUTION: Developer 3 after performing a development processing in a development processing portion 5 is made to flow into a developing tank 1. At this time, bubbles 9 to which the scum sticks are generated on the surface of the developer 3. The bubbles 9 generated one after another have their escape cut off and are naturally pushed out upwardly in a narrow space partitioned with a division plate 6. That is, by providing the division plate 6 to reduce the volume of a space where the bubbles 9 can exist, a pushing force of the bubbles 9 themselves is increased and the bubbles 9 move above the developing tank 1 according to natural pushing force generated in the bubbles 9 themselves. The bubbles 9 are naturally ejected to piping 7 from an upper part of the developing tank 1. The ejected bubbles 9 go into a scum removing portion 8, and the bubbles 9 to which the scum sticks are removed from a waste line. COPYRIGHT: (C)2008,JPO&amp;INPIT</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB1cQ1z9fEP8HX1C1EICPJ3dg0O9g_iYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYWhqaWlkaGjsZEKQIA7fEfnQ</recordid><startdate>20080710</startdate><enddate>20080710</enddate><creator>NOMA HIROSHI</creator><creator>KAMIMURA KAZUHIDE</creator><scope>EVB</scope></search><sort><creationdate>20080710</creationdate><title>DEVELOPMENT PROCESSOR</title><author>NOMA HIROSHI ; KAMIMURA KAZUHIDE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008159921A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NOMA HIROSHI</creatorcontrib><creatorcontrib>KAMIMURA KAZUHIDE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NOMA HIROSHI</au><au>KAMIMURA KAZUHIDE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVELOPMENT PROCESSOR</title><date>2008-07-10</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To provide a development processor, by which a running cost can be reduced while removing scum and a cost for a capacity investment can be cut. SOLUTION: Developer 3 after performing a development processing in a development processing portion 5 is made to flow into a developing tank 1. At this time, bubbles 9 to which the scum sticks are generated on the surface of the developer 3. The bubbles 9 generated one after another have their escape cut off and are naturally pushed out upwardly in a narrow space partitioned with a division plate 6. That is, by providing the division plate 6 to reduce the volume of a space where the bubbles 9 can exist, a pushing force of the bubbles 9 themselves is increased and the bubbles 9 move above the developing tank 1 according to natural pushing force generated in the bubbles 9 themselves. The bubbles 9 are naturally ejected to piping 7 from an upper part of the developing tank 1. The ejected bubbles 9 go into a scum removing portion 8, and the bubbles 9 to which the scum sticks are removed from a waste line. COPYRIGHT: (C)2008,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
PHYSICS
SEMICONDUCTOR DEVICES
SEPARATION
TRANSPORTING
title DEVELOPMENT PROCESSOR
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