CHEMICAL SUPPLY APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
PROBLEM TO BE SOLVED: To provide a chemical supply apparatus with which gas dissolved in a chemical can be removed, and to provide a method for manufacturing a semiconductor device using it. SOLUTION: A chemical storage container 2 for storing a chemical is provided with an inner container 22 formed...
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creator | ASAHI KENICHI TANAKA MIKIHIRO |
description | PROBLEM TO BE SOLVED: To provide a chemical supply apparatus with which gas dissolved in a chemical can be removed, and to provide a method for manufacturing a semiconductor device using it. SOLUTION: A chemical storage container 2 for storing a chemical is provided with an inner container 22 formed of a flexible material which is gas-permeable and liquid-impermeable and an outer container 21 which receives the inner container 22. The inner container 22 is compressed by pressure from outside by introducing pressurized gas between the outer container 21 and the inner container 22 through pressurized piping 3. The chemical delivered from the inner container 22 by pressurization is supplied to an object through supply piping 4. Also, a vacuum pump 10 is provided for reducing the pressure of a space between the inner container 22 and the outer container 21 during a chemical supply waiting period. COPYRIGHT: (C)2008,JPO&INPIT |
format | Patent |
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SOLUTION: A chemical storage container 2 for storing a chemical is provided with an inner container 22 formed of a flexible material which is gas-permeable and liquid-impermeable and an outer container 21 which receives the inner container 22. The inner container 22 is compressed by pressure from outside by introducing pressurized gas between the outer container 21 and the inner container 22 through pressurized piping 3. The chemical delivered from the inner container 22 by pressurization is supplied to an object through supply piping 4. Also, a vacuum pump 10 is provided for reducing the pressure of a space between the inner container 22 and the outer container 21 during a chemical supply waiting period. 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SOLUTION: A chemical storage container 2 for storing a chemical is provided with an inner container 22 formed of a flexible material which is gas-permeable and liquid-impermeable and an outer container 21 which receives the inner container 22. The inner container 22 is compressed by pressure from outside by introducing pressurized gas between the outer container 21 and the inner container 22 through pressurized piping 3. The chemical delivered from the inner container 22 by pressurization is supplied to an object through supply piping 4. Also, a vacuum pump 10 is provided for reducing the pressure of a space between the inner container 22 and the outer container 21 during a chemical supply waiting period. COPYRIGHT: (C)2008,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | CHEMICAL SUPPLY APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
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