APPARATUS AND METHOD FOR FORMING PATTERN
PROBLEM TO BE SOLVED: To suppress the unevenness occurring in a pattern in the formation of the pattern comprising a plurality of linear pattern elements by discharging a pattern forming material from a plurality of discharge ports. SOLUTION: The pattern forming apparatus 1 is provided with a nozzle...
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| creator | YABE MANABU |
| description | PROBLEM TO BE SOLVED: To suppress the unevenness occurring in a pattern in the formation of the pattern comprising a plurality of linear pattern elements by discharging a pattern forming material from a plurality of discharge ports. SOLUTION: The pattern forming apparatus 1 is provided with a nozzle part 5 having a plurality of the discharge ports and a stage moving mechanism 2 for moving a substrate 9 to the nozzle part 5 and the pattern comprising the plurality of the linear and rib-like pattern elements arranged with a fixed pitch on the substrate 9 is formed by moving the substrate 9 while the pattern forming material is continuously discharged from the plurality of the discharge ports of the nozzle part. In the pattern forming apparatus 1, the ratio of the quantity of the pattern forming material given to the substrate 9 from the nozzle part 5 to the relative moving distance of the nozzle part 5 is irregularly changed by changing the discharge rate or the like of the pattern forming material. As a result, the width or the height of each pattern element is changed irregularly and to suppress the unevenness occurring on the stripe like pattern. COPYRIGHT: (C)2008,JPO&INPIT |
| format | Patent |
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SOLUTION: The pattern forming apparatus 1 is provided with a nozzle part 5 having a plurality of the discharge ports and a stage moving mechanism 2 for moving a substrate 9 to the nozzle part 5 and the pattern comprising the plurality of the linear and rib-like pattern elements arranged with a fixed pitch on the substrate 9 is formed by moving the substrate 9 while the pattern forming material is continuously discharged from the plurality of the discharge ports of the nozzle part. In the pattern forming apparatus 1, the ratio of the quantity of the pattern forming material given to the substrate 9 from the nozzle part 5 to the relative moving distance of the nozzle part 5 is irregularly changed by changing the discharge rate or the like of the pattern forming material. As a result, the width or the height of each pattern element is changed irregularly and to suppress the unevenness occurring on the stripe like pattern. 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SOLUTION: The pattern forming apparatus 1 is provided with a nozzle part 5 having a plurality of the discharge ports and a stage moving mechanism 2 for moving a substrate 9 to the nozzle part 5 and the pattern comprising the plurality of the linear and rib-like pattern elements arranged with a fixed pitch on the substrate 9 is formed by moving the substrate 9 while the pattern forming material is continuously discharged from the plurality of the discharge ports of the nozzle part. In the pattern forming apparatus 1, the ratio of the quantity of the pattern forming material given to the substrate 9 from the nozzle part 5 to the relative moving distance of the nozzle part 5 is irregularly changed by changing the discharge rate or the like of the pattern forming material. As a result, the width or the height of each pattern element is changed irregularly and to suppress the unevenness occurring on the stripe like pattern. 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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | APPARATUS AND METHOD FOR FORMING PATTERN |
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