METHOD AND DEVICE FOR MANUFACTURING ANTI-ADHESIVE AND WEAR-RESISTANT SURFACE
PROBLEM TO BE SOLVED: To economically deposit by continuous production, an ink-repellent, easily cleanable, anti-adhesive and wear-resistant layer on a rotating body or the outer circumferential face member thereof (a coating object) used in a paper machine or a rotary press, in particular on the ro...
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| creator | HOPFE VOLKMAR DANI INES KOCH MICHAEL DR LINASCHKE DORIT PATZELT BERND |
| description | PROBLEM TO BE SOLVED: To economically deposit by continuous production, an ink-repellent, easily cleanable, anti-adhesive and wear-resistant layer on a rotating body or the outer circumferential face member thereof (a coating object) used in a paper machine or a rotary press, in particular on the roughened structure of an impression cylinder without damaging concentricity. SOLUTION: A roughened structure for reducing adhesion is made on a surface then a carbon coating is deposited by a PACVD (plasma-assisted chemical vapor deposition) process, thereby an anti-adhesive and wear-resistant layer is deposited, wherein in order that the coating contains elements C, H, Si, O and F in various compositions, a C-H-Si-O base lattice is formed using a hydrocarbon and silicon-containing precursor in the first stage and fluorine is taken in from a fluorine precursor in the second stage, At this time, the head of a movable reactor shaped by copying the profile of a coating object surrounds a reaction chamber together with the surface of the coating object and further traverses over the coating object without contact, and the precursor and scavenging gas are fed to the reaction chamber with a PACVD plasma flow and an another gas flow. COPYRIGHT: (C)2008,JPO&INPIT |
| format | Patent |
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SOLUTION: A roughened structure for reducing adhesion is made on a surface then a carbon coating is deposited by a PACVD (plasma-assisted chemical vapor deposition) process, thereby an anti-adhesive and wear-resistant layer is deposited, wherein in order that the coating contains elements C, H, Si, O and F in various compositions, a C-H-Si-O base lattice is formed using a hydrocarbon and silicon-containing precursor in the first stage and fluorine is taken in from a fluorine precursor in the second stage, At this time, the head of a movable reactor shaped by copying the profile of a coating object surrounds a reaction chamber together with the surface of the coating object and further traverses over the coating object without contact, and the precursor and scavenging gas are fed to the reaction chamber with a PACVD plasma flow and an another gas flow. 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SOLUTION: A roughened structure for reducing adhesion is made on a surface then a carbon coating is deposited by a PACVD (plasma-assisted chemical vapor deposition) process, thereby an anti-adhesive and wear-resistant layer is deposited, wherein in order that the coating contains elements C, H, Si, O and F in various compositions, a C-H-Si-O base lattice is formed using a hydrocarbon and silicon-containing precursor in the first stage and fluorine is taken in from a fluorine precursor in the second stage, At this time, the head of a movable reactor shaped by copying the profile of a coating object surrounds a reaction chamber together with the surface of the coating object and further traverses over the coating object without contact, and the precursor and scavenging gas are fed to the reaction chamber with a PACVD plasma flow and an another gas flow. 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SOLUTION: A roughened structure for reducing adhesion is made on a surface then a carbon coating is deposited by a PACVD (plasma-assisted chemical vapor deposition) process, thereby an anti-adhesive and wear-resistant layer is deposited, wherein in order that the coating contains elements C, H, Si, O and F in various compositions, a C-H-Si-O base lattice is formed using a hydrocarbon and silicon-containing precursor in the first stage and fluorine is taken in from a fluorine precursor in the second stage, At this time, the head of a movable reactor shaped by copying the profile of a coating object surrounds a reaction chamber together with the surface of the coating object and further traverses over the coating object without contact, and the precursor and scavenging gas are fed to the reaction chamber with a PACVD plasma flow and an another gas flow. COPYRIGHT: (C)2008,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LINING MACHINES MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE METALLURGY PERFORMING OPERATIONS PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM PRINTING PRINTING MACHINES OR PRESSES PRINTING PLATES OR FOILS STAMPS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING TYPEWRITERS |
| title | METHOD AND DEVICE FOR MANUFACTURING ANTI-ADHESIVE AND WEAR-RESISTANT SURFACE |
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