SUBSTRATE COVER, AND CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD
PROBLEM TO BE SOLVED: To provide a mechanism of decreasing electrostatic charges on a side face of a substrate. SOLUTION: A substrate cover 10 is placed on a substrate 101 where an image is drawn by using an electron beam, and the cover comprises: a frame 12 having an outer dimension larger than the...
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| creator | TACHIKAWA YUICHI |
| description | PROBLEM TO BE SOLVED: To provide a mechanism of decreasing electrostatic charges on a side face of a substrate. SOLUTION: A substrate cover 10 is placed on a substrate 101 where an image is drawn by using an electron beam, and the cover comprises: a frame 12 having an outer dimension larger than the circumference end of the substrate 101 and having an opening in the center part in a dimension smaller than the circumference end of the substrate; and a grounding pin 16 which is provided on the lower face side of the frame 12 and connected to electrically conduct the substrate 101. By this method, deviation of a beam trajectory due to electrostatic charges on a side face of the substrate 101 can be prevented. COPYRIGHT: (C)2008,JPO&INPIT |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008058809A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008058809A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008058809A3</originalsourceid><addsrcrecordid>eNrjZHAJDnUKDglyDHFVcPYPcw3SUXD0c1Fw9nAMcnd1UQhwDArxdPZxVXBydfRVcAlyDPf0c1dwcQ3zdHYFK_R1DfHwd-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBhYGphYWBpaOxkQpAgBu2Sux</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE COVER, AND CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD</title><source>esp@cenet</source><creator>TACHIKAWA YUICHI</creator><creatorcontrib>TACHIKAWA YUICHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a mechanism of decreasing electrostatic charges on a side face of a substrate. SOLUTION: A substrate cover 10 is placed on a substrate 101 where an image is drawn by using an electron beam, and the cover comprises: a frame 12 having an outer dimension larger than the circumference end of the substrate 101 and having an opening in the center part in a dimension smaller than the circumference end of the substrate; and a grounding pin 16 which is provided on the lower face side of the frame 12 and connected to electrically conduct the substrate 101. By this method, deviation of a beam trajectory due to electrostatic charges on a side face of the substrate 101 can be prevented. COPYRIGHT: (C)2008,JPO&INPIT</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080313&DB=EPODOC&CC=JP&NR=2008058809A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25569,76552</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20080313&DB=EPODOC&CC=JP&NR=2008058809A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TACHIKAWA YUICHI</creatorcontrib><title>SUBSTRATE COVER, AND CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD</title><description>PROBLEM TO BE SOLVED: To provide a mechanism of decreasing electrostatic charges on a side face of a substrate. SOLUTION: A substrate cover 10 is placed on a substrate 101 where an image is drawn by using an electron beam, and the cover comprises: a frame 12 having an outer dimension larger than the circumference end of the substrate 101 and having an opening in the center part in a dimension smaller than the circumference end of the substrate; and a grounding pin 16 which is provided on the lower face side of the frame 12 and connected to electrically conduct the substrate 101. By this method, deviation of a beam trajectory due to electrostatic charges on a side face of the substrate 101 can be prevented. COPYRIGHT: (C)2008,JPO&INPIT</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHAJDnUKDglyDHFVcPYPcw3SUXD0c1Fw9nAMcnd1UQhwDArxdPZxVXBydfRVcAlyDPf0c1dwcQ3zdHYFK_R1DfHwd-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBhYGphYWBpaOxkQpAgBu2Sux</recordid><startdate>20080313</startdate><enddate>20080313</enddate><creator>TACHIKAWA YUICHI</creator><scope>EVB</scope></search><sort><creationdate>20080313</creationdate><title>SUBSTRATE COVER, AND CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD</title><author>TACHIKAWA YUICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008058809A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>TACHIKAWA YUICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TACHIKAWA YUICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE COVER, AND CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD</title><date>2008-03-13</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To provide a mechanism of decreasing electrostatic charges on a side face of a substrate. SOLUTION: A substrate cover 10 is placed on a substrate 101 where an image is drawn by using an electron beam, and the cover comprises: a frame 12 having an outer dimension larger than the circumference end of the substrate 101 and having an opening in the center part in a dimension smaller than the circumference end of the substrate; and a grounding pin 16 which is provided on the lower face side of the frame 12 and connected to electrically conduct the substrate 101. By this method, deviation of a beam trajectory due to electrostatic charges on a side face of the substrate 101 can be prevented. COPYRIGHT: (C)2008,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | SUBSTRATE COVER, AND CHARGED PARTICLE BEAM DRAWING DEVICE AND METHOD |
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