MOLD AND MANUFACTURING METHOD OF MOLD

PROBLEM TO BE SOLVED: To provide a manufacturing method of a mold having highly precise fine pattern. SOLUTION: An oxidized film 120 is formed on the surface of a substrate 110 further a resist layer 130 on the oxidized film 120. Next the surface of resist layer 130 is irradiated with electron beam...

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Bibliographische Detailangaben
Hauptverfasser:	YUSA SATOSHI, KITADA MINORU, ARITSUKA YUKI, ISHIKAWA MIKIO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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