CURABLE COMPOSITION AND CURED PRODUCT THEREOF
PROBLEM TO BE SOLVED: To provide a curable composition which excels in storage stability, can be constituted as a single-component curable composition, and gives an excellent cured coating film satisfying properties such as electric insulation, PCT (pressure cooker test) resistance, adhesion, resist...
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creator | KOBIYAMA NOBORU MORINO HIROMITSU |
description | PROBLEM TO BE SOLVED: To provide a curable composition which excels in storage stability, can be constituted as a single-component curable composition, and gives an excellent cured coating film satisfying properties such as electric insulation, PCT (pressure cooker test) resistance, adhesion, resistance to the heat of soldering, chemical resistance, resistance to electroless gold plating and moisture-absorption resistance. SOLUTION: The curable composition contains: (A) a carboxyl group-containing photosensitive compound obtained by reacting the reaction product (e) of a compound (a) having two or more epoxy groups in a molecule and an unsaturated group-containing monocarboxylic acid (b) or the mixture (d) of the unsaturated group-containing monocarboxylic acid (b) and a compound (c) having a reactive group which reacts with an epoxy group with a polybasic acid anhydride (f); (B) an epoxy resin having 1,3-dioxolane ring, which is obtained by partially adding a ketone to an epoxy resin having two or more epoxy groups in a molecule, and (C) a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT |
format | Patent |
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SOLUTION: The curable composition contains: (A) a carboxyl group-containing photosensitive compound obtained by reacting the reaction product (e) of a compound (a) having two or more epoxy groups in a molecule and an unsaturated group-containing monocarboxylic acid (b) or the mixture (d) of the unsaturated group-containing monocarboxylic acid (b) and a compound (c) having a reactive group which reacts with an epoxy group with a polybasic acid anhydride (f); (B) an epoxy resin having 1,3-dioxolane ring, which is obtained by partially adding a ketone to an epoxy resin having two or more epoxy groups in a molecule, and (C) a photopolymerization initiator. 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SOLUTION: The curable composition contains: (A) a carboxyl group-containing photosensitive compound obtained by reacting the reaction product (e) of a compound (a) having two or more epoxy groups in a molecule and an unsaturated group-containing monocarboxylic acid (b) or the mixture (d) of the unsaturated group-containing monocarboxylic acid (b) and a compound (c) having a reactive group which reacts with an epoxy group with a polybasic acid anhydride (f); (B) an epoxy resin having 1,3-dioxolane ring, which is obtained by partially adding a ketone to an epoxy resin having two or more epoxy groups in a molecule, and (C) a photopolymerization initiator. 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SOLUTION: The curable composition contains: (A) a carboxyl group-containing photosensitive compound obtained by reacting the reaction product (e) of a compound (a) having two or more epoxy groups in a molecule and an unsaturated group-containing monocarboxylic acid (b) or the mixture (d) of the unsaturated group-containing monocarboxylic acid (b) and a compound (c) having a reactive group which reacts with an epoxy group with a polybasic acid anhydride (f); (B) an epoxy resin having 1,3-dioxolane ring, which is obtained by partially adding a ketone to an epoxy resin having two or more epoxy groups in a molecule, and (C) a photopolymerization initiator. COPYRIGHT: (C)2007,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
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language | eng |
recordid | cdi_epo_espacenet_JP2007199246A |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
title | CURABLE COMPOSITION AND CURED PRODUCT THEREOF |
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