MULTILAYER-FILM REFLECTING MIRROR AND EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To provide a multilayer-film reflecting mirror which suppresses a degradation in reflectance by preventing the diffusion occurring on a substance of high reflectance and that occurring on a substance of low reflectance. SOLUTION: In the multilayer-film reflecting mirror 2 inclu...

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1. Verfasser:	MATSUNARI SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GAMMA RAY OR X-RAY MICROSCOPES IRRADIATION DEVICES NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a multilayer-film reflecting mirror which suppresses a degradation in reflectance by preventing the diffusion occurring on a substance of high reflectance and that occurring on a substance of low reflectance. SOLUTION: In the multilayer-film reflecting mirror 2 including a multilayer film 12 constituted by depositing at least two kinds of layers 6 and 8, composed mainly of prescribed substances, alternately and periodically on the surface of a substrate to form the film 12, diffusion prevention layers 10a and 10b which are different in material and/or thickness are formed on the basis of a prescribed substance forming a lower layer in every interface of the multilayer film 12. COPYRIGHT: (C)2007,JPO&INPIT