LITHOGRAPHIC APPARATUS, SYSTEM, AND METHOD FOR MANUFACTURING DEVICE

LITHOGRAPHIC APPARATUS, SYSTEM, AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which it is unlikely that the lifetime of optical elements is reduced due to etching and sputtering caused by ionization of the background gas. SOLUTION: An optically activated device configured so as to guide radiation beam or patterned r...

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Hauptverfasser: BANINE VADIM YEVGENYEVICH, MERTENS BASTIAAN MATTHIAS, NIJKERK MICHIEL DAVID, JOSEPHINA MOORS JOHANNES H, LORENZ VAN DER VELDEN MARC HUBERTUS, WOLSCHRIJN BASTIAAN T, WEISS MARKUS
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Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator BANINE VADIM YEVGENYEVICH
MERTENS BASTIAAN MATTHIAS
NIJKERK MICHIEL DAVID
JOSEPHINA MOORS JOHANNES H
LORENZ VAN DER VELDEN MARC HUBERTUS
WOLSCHRIJN BASTIAAN T
WEISS MARKUS
description PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which it is unlikely that the lifetime of optical elements is reduced due to etching and sputtering caused by ionization of the background gas. SOLUTION: An optically activated device configured so as to guide radiation beam or patterned radiation beam M and a support structure 12, configured so as to support optically activated devices M1 to M6 are provided; and further, a gas supplier 14 for supplying a background gas 16 to a system is also provided. The radiation beam or the patterned radiation beam and the background gas react, and a plasma containing a plurality of ions is formed. The support structure comprises an element 20, provided with a material with a small sputter rate, a material with a large sputter threshold energy, or a material with a large ion implantation yield, in order to suppress the sputtering and the generation of sputtering product. COPYRIGHT: (C)2007,JPO&INPIT
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title LITHOGRAPHIC APPARATUS, SYSTEM, AND METHOD FOR MANUFACTURING DEVICE
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