SYSTEM AND METHOD FOR MONITORING AND DIAGNOSING SYSTEM STATUS AND PERFORMANCE
PROBLEM TO BE SOLVED: To provide a system, as well as its method, that performs real-time monitoring and/or diagnosis of tools' performance as to system deterioration of a lithography apparatus before detecting defects at the end product stage. SOLUTION: This is a hierarchical data structure th...
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| creator | REUHMAN-HUISKEN MARIA E SCHOEMAKER ERIK J BOOTSMA TIMOTHEUS MARC VINCENT VAN RHEE TASJA JACQMIN ERIC SALPIETRO ROSARIA VAN KERVINCK MARCEL NICOLAAS J LEVASIER LEON M PRINS MARTIN |
| description | PROBLEM TO BE SOLVED: To provide a system, as well as its method, that performs real-time monitoring and/or diagnosis of tools' performance as to system deterioration of a lithography apparatus before detecting defects at the end product stage. SOLUTION: This is a hierarchical data structure that includes elements monitored on the basis of its diagnosis dataset and key performance indexes, wherein the system hierarchy 200 has a process sequence 202 to be run during system operation and is composed of a plurality of process steps 210-218. A higher level of the hierarchy indicates major system functions, and a sub-function derives the major system functions, dispatching them to a lower level. The hierarchical key performance indexes 001KPI-039KPI actively monitor the system functions, the diagnosis dataset 280-286 passively monitor the system functions, and the data analyzer enables a root cause of a system deflection to be identified. COPYRIGHT: (C)2007,JPO&INPIT |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | SYSTEM AND METHOD FOR MONITORING AND DIAGNOSING SYSTEM STATUS AND PERFORMANCE |
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