METHOD OF CORRECTING LITHOGRAPHY PROJECTION OBJECTIVE, AND THE OBJECTIVE

PROBLEM TO BE SOLVED: To provide a method of correcting at least one image defect of a catadioptric projection objective. SOLUTION: The method is provided for correcting at least one image defect in a projection objective 20 of a lithography projection exposure machine. The projection objective 20 c...

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Bibliographische Detailangaben

Hauptverfasser:	GRUNER TORALF, GRAESCHUS VOLKER, ULRICH WILHELM, OKON THOMAS, BITTNER BORIS, WABRA NORBERT
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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