COATER AND COATING METHOD
PROBLEM TO BE SOLVED: To provide a slit-coating type coater eliminating omission of detection of even a microscopic foreign matter and very low protrusions of a substrate and ensuring protection of a coating head, and a slit-coating type coating method. SOLUTION: A slit-coating type coater 1 is equi...
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| creator | MIHASHI MITSUSACHI YUZAWA ATSUSHI |
| description | PROBLEM TO BE SOLVED: To provide a slit-coating type coater eliminating omission of detection of even a microscopic foreign matter and very low protrusions of a substrate and ensuring protection of a coating head, and a slit-coating type coating method. SOLUTION: A slit-coating type coater 1 is equipped with a means of moving a substrate 10 relatively with respect to the coating head 2 and comprises a coating head 2 causing a coating fluid to flow from a slit-shaped opening on the surface of a flat substrate 10 to be coated, a plate member 4 arranged together with the coating head in an integrated form, a tip part 5 lying at the tip of the plate member and extending linearly in parallel with the surface of the substrate and a detection section 6 arranged in the upstream of the plate member in the coating direction and consisting of a laser detecting foreign matter, etc. COPYRIGHT: (C)2006,JPO&NCIPI |
| format | Patent |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | COATER AND COATING METHOD |
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