FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method which enable pre-treatment such as pre-sputtering in a vacuum vessel to be performed without arranging complicated shutter mechanism. SOLUTION: The film deposition apparatus performs film deposition in such a m...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YAMANISHI HITOSHI, MORI SATOSHI, SUEMITSU TOSHIYUKI, NAKAJIMA SEIJI, OKUMA TAKAFUMI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!