FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a film deposition method which enable pre-treatment such as pre-sputtering in a vacuum vessel to be performed without arranging complicated shutter mechanism. SOLUTION: The film deposition apparatus performs film deposition in such a manner that a plurality of trays 4 are shifted in order to each of the plurality of vacuum vessels 1 connected in series and film-depositing treatment is applied to a work 6 held with the tray 4 in each vacuum vessel 1, wherein each of the plurality of trays 4 has constitution having, in at least the end parts, projecting parts 10 functioning as blocking parts for holding a prescribed atmosphere in the vacuum vessel 1 with conductance by blocking opening holes 2a disposed at both end parts of the vessel so as to leave a gap permissible to pass the tray 4 itself therethrough when the tray is set at a prescribed film-depositing position in each vacuum vessel 1. Some trays among the plurality of trays 4 are used as dummy trays 4b which do not convey the work 6, and the pre-deposition treatment is performed in the vacuum vessel 1 into which the dummy tray 4b is shifted. The individual atmosphere can be held in each vacuum vessel 1 by hermetically sealing the vacuum vessel with the tray 4 itself functioning as the shut-off means. COPYRIGHT: (C)2006,JPO&NCIPI