PATTERNING METHOD AND PROCESS FOR MANUFACTURING INK JET RECORDING HEAD

PROBLEM TO BE SOLVED: To provide a patterning method in which the wall face at a recess in a pattern can be tapered while sustaining a sharp edge at the opening of the pattern even if the pattern is formed by photolithography, and to provide a process for manufacturing an ink jet recording head by a...

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Bibliographische Detailangaben
Hauptverfasser:	ONO NORIYUKI, FUKUDA MAKI, UEDA HIKARI, OKUMA NORIO, OSUMI MASANORI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY CORRECTION OF TYPOGRAPHICAL ERRORS DYES i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS
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