SELF-ADAPTATION FEED-FORWARD CONTROL ADJUSTMENT FOR MOTION SYSTEM, AND LITHOGRAPHY EQUIPMENT HAVING SUCH MOTION SYSTEM

PROBLEM TO BE SOLVED: To provide a system that controls a high-precision motion such as a stepping and scanning operation of a lithography projection apparatus, i.e., a flexible control system that combines lower feed-forward control and iterative learning control with no need of manual adjustment w...

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Bibliographische Detailangaben
1. Verfasser:	TOUSAIN ROB
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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