SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR

PROBLEM TO BE SOLVED: To provide a semiconductor device in which a circuit element showing resistance to high voltage and suppressed characteristic fluctuation is formed on the surface of an SOI (silicon on insulator) board and which can be manufactured inexpensively, and to provide a manufacturing...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KUZUHARA TAKESHI, YAMADA AKIRA
Format: Patent
Sprache:eng
Schlagworte:
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