DEVICE AND METHOD FOR WAFER LEVEL BURN-IN

PROBLEM TO BE SOLVED: To provide a wafer level burn-in device and a wafer level burn-in method for preventing a probe from being exhausted and burned, by reducing an electric load applied to a wafer simultaneously and suppressing the transitional rise of the temperature of the wafer. SOLUTION: The w...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TERANISHI MASATOSHI, SEGAWA AKITSUGU
Format: Patent
Sprache:eng
Schlagworte:
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