MANUFACTURING METHOD OF ELECTRO-OPTICAL APPARATUS

PROBLEM TO BE SOLVED: To provide a manufacturing method of an electro-optical apparatus, having high writing speed of a data signal and superior display characteristics by preventing increase in the contact resistance of the electro-optical apparatus provided with a prescribed element structure. SOL...

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description PROBLEM TO BE SOLVED: To provide a manufacturing method of an electro-optical apparatus, having high writing speed of a data signal and superior display characteristics by preventing increase in the contact resistance of the electro-optical apparatus provided with a prescribed element structure. SOLUTION: The manufacturing method of the electro-optical apparatus having an overlayer structure provided with the prescribed element structure includes a step of forming a patterned tantalum layer on a substrate, a step of forming a tantalum oxide layer by oxidizing the surface of the tantalum layer, a step of forming a patterned chromium layer so as to be superimposed on a part of the tantalum oxide layer, a step of subjecting the substrate, on which the chromium layer is formed to heat treatment in an inert gas, a step of forming an interlayer insulating layer so that a contact hole is disposed at a position superimposed on the chromium layer and a step of forming a pixel electrode, consisting of a conductive layer so as to be electrically connected to the chromium layer via the contact hole. COPYRIGHT: (C)2006,JPO&NCIPI
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SOLUTION: The manufacturing method of the electro-optical apparatus having an overlayer structure provided with the prescribed element structure includes a step of forming a patterned tantalum layer on a substrate, a step of forming a tantalum oxide layer by oxidizing the surface of the tantalum layer, a step of forming a patterned chromium layer so as to be superimposed on a part of the tantalum oxide layer, a step of subjecting the substrate, on which the chromium layer is formed to heat treatment in an inert gas, a step of forming an interlayer insulating layer so that a contact hole is disposed at a position superimposed on the chromium layer and a step of forming a pixel electrode, consisting of a conductive layer so as to be electrically connected to the chromium layer via the contact hole. 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SOLUTION: The manufacturing method of the electro-optical apparatus having an overlayer structure provided with the prescribed element structure includes a step of forming a patterned tantalum layer on a substrate, a step of forming a tantalum oxide layer by oxidizing the surface of the tantalum layer, a step of forming a patterned chromium layer so as to be superimposed on a part of the tantalum oxide layer, a step of subjecting the substrate, on which the chromium layer is formed to heat treatment in an inert gas, a step of forming an interlayer insulating layer so that a contact hole is disposed at a position superimposed on the chromium layer and a step of forming a pixel electrode, consisting of a conductive layer so as to be electrically connected to the chromium layer via the contact hole. COPYRIGHT: (C)2006,JPO&amp;NCIPI</abstract><oa>free_for_read</oa></addata></record>
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subjects DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
title MANUFACTURING METHOD OF ELECTRO-OPTICAL APPARATUS
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