MANUFACTURING METHOD OF SUBSTRATE FOR MAGNETIC RECORDING MEDIUM, AND BOTH-SURFACE POLISHER AND CARRIER FOR SUBSTRATE POLISHING USED IN THE METHOD

PROBLEM TO BE SOLVED: To reduce residual swarf after polishing by suppressing the adsorption of polishing abrasive grains to a substrate. SOLUTION: In this manufacturing method of the substrate for a magnetic recording medium, a both-surface polisher is used which polishes both surfaces of a substra...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MINASAWA HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS PHYSICS POLISHING TRANSPORTING
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