METHOD AND APPARATUS FOR INSPECTING FOREIGN MATTER OF SIDE WALL OF OPENING OF STENCIL MASK
PROBLEM TO BE SOLVED: To provide an inspection method for effectively inspecting foreign matter bonded to the side wall of a support part or beam of a stencil mask by a simple method, and to provide an inspection device therefor. SOLUTION: In the method for inspecting the side wall (21) of the suppo...
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| creator | SUSA TAKASHI YONEKURA ISAO NOHAMA SHIYOUJI TAMURA AKIRA ITOU KOUJIROU NAKANO HIROYUKI IWASE KAZUYA KUNIYA SHINJI MORIYA SHIGERU KITAGAWA TETSUYA |
| description | PROBLEM TO BE SOLVED: To provide an inspection method for effectively inspecting foreign matter bonded to the side wall of a support part or beam of a stencil mask by a simple method, and to provide an inspection device therefor. SOLUTION: In the method for inspecting the side wall (21) of the support frame (19) or beam (18) substantially vertically formed with respect to the surface of the stencil mark (10), an imaging means (41) is arranged so that the optical axis (38) thereof is inclined at a predetermined angle (θ) in the direction vertical to the surface of the stencil mask and a plurality of images are taken by changing the focal position of the imaging means with respect to the side wall of the support frame (19) or beam (18) while the whole focal image related to the sided wall of the support frame (19) or beam (18) is synthesized from a plurality of the images to be displayed by a display means (51). COPYRIGHT: (C)2006,JPO&NCIPI |
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SOLUTION: In the method for inspecting the side wall (21) of the support frame (19) or beam (18) substantially vertically formed with respect to the surface of the stencil mark (10), an imaging means (41) is arranged so that the optical axis (38) thereof is inclined at a predetermined angle (θ) in the direction vertical to the surface of the stencil mask and a plurality of images are taken by changing the focal position of the imaging means with respect to the side wall of the support frame (19) or beam (18) while the whole focal image related to the sided wall of the support frame (19) or beam (18) is synthesized from a plurality of the images to be displayed by a display means (51). 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SOLUTION: In the method for inspecting the side wall (21) of the support frame (19) or beam (18) substantially vertically formed with respect to the surface of the stencil mark (10), an imaging means (41) is arranged so that the optical axis (38) thereof is inclined at a predetermined angle (θ) in the direction vertical to the surface of the stencil mask and a plurality of images are taken by changing the focal position of the imaging means with respect to the side wall of the support frame (19) or beam (18) while the whole focal image related to the sided wall of the support frame (19) or beam (18) is synthesized from a plurality of the images to be displayed by a display means (51). COPYRIGHT: (C)2006,JPO&NCIPI</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING |
| title | METHOD AND APPARATUS FOR INSPECTING FOREIGN MATTER OF SIDE WALL OF OPENING OF STENCIL MASK |
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